IP Library Granted Patent US 7,040,011
Granted Patent B2
US 7,040,011 · App. 10/045,036 · Granted May 9, 2006

Wiring substrate manufacturing method

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Quick Facts
Patent No.
US 7,040,011
App. No.
10/045,036
Granted
May 9, 2006
Kind
B2
Abstract

A wiring substrate is manufactured in short TAT. Wirings of the wiring substrate are formed by an exposure treatment using a photomask which has shade patterns each containing at least nano particles and a binder.

Claims (16)

1. A wiring substrate manufacturing method comprising a step of forming a wiring of a wiring substrate which forming step includes a projection exposure treatment in which exposure light from photomask is transmitted through a projection lens to pattern a photoresist, the photomask having a shade pattern formed on a plate, said shade pattern containing at least nanoparticles and a binder, the nano particles comprising black pigment and the method further including a step of forming each of said shade patterns on said plate by printing a shade material containing said black of about 30% or more.

2. The wiring substrate manufacturing method according to claim 1 , wherein said material contains said black pigment of 30% to 40%.

3. The wiring substrate manufacturing method according to claim 1 , wherein said shade pattern corresponds to said wirings, respectively.

4. The wiring substrate manufacturing method according to claim 1 , wherein an area of said shade pattern is smaller than an area of a light transmission region having no shade pattern.

5. The wiring substrate manufacturing method according to claim 1 , further comprising the steps of:

forming a line pattern for forming said wiring, in a thickness direction of a wiring substrate main body; and

forming a hole pattern which is a pattern for forming said wirings and which connects, to one another, line patterns located on difference wiring layers.

6. The wiring substrate manufacturing method according to claim 1 , wherein said nano particles consist of carbon.

7. The wiring substrate manufacturing method according to claim 1 , further comprising a step of mounting one or a plurality of electronic components on a first surface of said substrate.

8. The wiring substrate manufacturing method according to claim 7 , further comprising a step of mounting, while a second surface opposite to the first surface of said substrate faces a printed wiring substrate, the substrate on which said one or plurality of electronic components are mounted, on a printed wiring substrate.

9. The wiring substrate manufacturing method according to claim 1 , wherein the plate having said shade pattern formed thereon is a glass plate.

10. The wiring substrate manufacturing method according to claim 1 , wherein the nano-particles scatter light used by the exposure treatment.

11. The wiring substrate manufacturing method according to claim 10 , wherein the nanoparticles are 200 nm or less in particle diameter.

12. The wiring substrate manufacturing method according to claim 11 , wherein the binder comprises a resist material containing light absorber that absorbs exposure light.

13. The wiring substrate manufacturing method according to claim 1 , wherein the binder comprises a resist material containing light absorber that absorbs exposure light.

14. The wiring substrate manufacturing method according to claim 1 , wherein the shade pattern has a dimension on the order of μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 11, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014244/0278 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2002
From: TANAKA, TOSHIHIKO; KUBO, MASAHARU; HATTORI, TAKASHI
To: HITACHI, LTD.
Reel/Frame 012496/0765 →