IP Library › Granted Patent US 6,878,039
Granted Patent B2
US 6,878,039 · App. 10/058,743 · Granted Apr 12, 2005

Polishing pad window for a chemical-mechanical polishing tool

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,878,039
App. No.
10/058,743
Granted
Apr 12, 2005
Kind
B2
Abstract

A polishing pad assembly for use in a chemical-mechanical polishing apparatus comprises a polishing pad having at least a first aperture therethrough and a platen for supporting the polishing pad having a second aperture therethrough at least a portion of which is larger than the first aperture. A substantially transparent plug includes at least a first section having a first dimension for positioning substantially within the first aperture and at least a second section having a second dimension larger than the first dimension for positioning substantially within the second aperture. The optical plug is made of a polymeric material which may be press-fit through the platen into polishing pad.

Claims (34)

1. A polishing assembly for use in a chemical mechanical polishing apparatus, comprising:

a polishing pad having at least a first aperture therethrough;

a platen for supporting said polishing pad, said platen having at least a second aperture therethrough having an internally threaded portion at least a portion of which is larger than the aperture of the polishing pad; and

a substantially transparent plug including at least a first section having a first dimension and at least a second section having a second dimension larger than said first dimension, said first section for positioning substantially within said first aperture and said second section for positioning substantially within said second aperture.

2. A polishing assembly according to claim 1 wherein said second section has an externally threaded portion that is received by said internally threaded portion.

3. A polishing assembly according to claim 1 further comprising a retaining member for securing said plug is said first and second apertures.

4. A polishing assembly according to claim 3 wherein said retaining member is externally threaded and received by said internally threaded portion.

5. A polishing assembly according to claim 4 wherein said retaining member is hollow to provide an optical path to said optical plug.

6. A polishing assembly according to claim 1 wherein said second aperture includes a first surface which is substantially smooth.

7. A polishing assembly according to claim 6 wherein said second aperture includes a second internally threaded surface.

8. A polishing assembly according to claim 6 wherein said first aperture is substantially cylindrical.

9. A polishing assembly according to claim 8 wherein said second aperture is substantially cylindrical.

10. A polishing assembly according to claim 6 wherein said second aperture includes a substantially conical section.

11. A polishing assembly according to claim 1 wherein said plug is made of a polymeric material.

12. A polishing assembly according to claim 11 wherein said plug is insertable through said platen into said polishing pad.

13. A polishing assembly according to claim 12 wherein said plug is press-fit through said platen into said polishing pad.

14. A polishing assembly for use in a chemical-mechanical polishing apparatus, comprising:

a polishing pad having at least a first aperture therethrough;

a platen for supporting said polishing pad, said platen having at least a second aperture therethrough having an internally threaded section at least a portion of which is larger than said first aperture; and

a removable, substantially transparent polymeric plug including at least a first section having a first dimension and at least a second section having a second dimension larger than said first dimension, said first section for positioning substantially within said first aperture and said second section for positioning substantially within said second aperture.

15. A polishing assembly according to claim 14 wherein said second section has an externally threaded portion that is received by said internally thread portion.

16. A polishing assembly according to claim 14 further comprising a retaining member for securing said plug in said first and second apertures.

17. A polishing assembly according to claim 16 wherein said retaining member is externally threaded and received by said internally threaded portion.

18. A polishing assembly according to claim 17 wherein said retaining member is hollow to provide an optical path to said optical plug.

19. A polishing assembly according to claim 14 wherein said second aperture includes a first surface which is substantially smooth.

20. A polishing assembly according to claim 19 wherein said second aperture includes a second internally threaded surface.

21. A polishing assembly according to claim 19 wherein said first aperture is substantially cylindrical.

22. A polishing assembly according to claim 21 wherein said second aperture is substantially cylindrical.

23. A polishing assembly according to claim 19 wherein said second aperture includes a substantially conical section.

24. An optical plug for providing an optical path through a platen/polishing pad of a chemical-mechanical polishing apparatus, said optical plug comprising:

a first section having a first dimension for positioning in said polishing pad; and

a substantially conical second section coupled to the first section, the second section having a second larger dimension for positioning in said platen and having a threaded portion.

25. An optical plug according to claim 24 wherein said optical plug is made of a polymeric material.

26. An optical plug according to claim 25 wherein said second section includes an externally threaded portion.