Granted Patent
Utility
US 6,537,734
· Confirmation No. 2366
METHOD AND APPARATUS FOR IMPROVING RESIST PATTERN DEVELOPING
Inventor:
Wei-Kay Chiu
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-02-04 | TRNA |
Transmittal of New Application | 4 | View | |
| 2002-02-04 | A.PE |
Preliminary Amendment | 2 | View | |
| 2002-02-04 | SPEC |
Specification | 13 | View | |
| 2002-02-04 | CLM |
Claims | 6 | View | |
| 2002-02-04 | ABST |
Abstract | 1 | View | |
| 2002-02-04 | DRW |
Drawings-only black and white line drawings | 5 | View | |
| 2002-02-04 | OATH |
Oath or Declaration filed | 1 | View |
Inventors
Wei-Kay Chiu
Shin-Chu Hsien, TAIWAN
Attorneys & Agents of Record
Classification
USPC
430/325
G03F7/3014
B41J2/145
G03F7/3021
Y10S134/902
Prosecution
- Examiner
- ASHTON, ROSEMARY E
- Art Unit
- 1752
- Customer No.
- 28112
- Docket No.
- TS1996-279CB
- Confirmation No.
- 2366
Publication
- Pub. No.
- US20020144707A1
- Pub. Date
- 2002-10-10
Patent Term Adjustment
0days
No recorded assignments were found for this patent.
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Quick Facts
- Patent No.
- US 6,537,734
- App. No.
- 10/061,661
- Filed
- 2002-02-04
- Granted
- 2003-03-25
- Pub. No.
- US20020144707A1
- Examiner
- ASHTON, ROSEMARY E
- Art Unit
- 1752
- PTA
- 0 days
External Links