IP Library › Granted Patent US 6,450,200
Granted Patent Utility
US 6,450,200 · Confirmation No. 6099

FLOW CONTROL OF PROCESS GAS IN SEMICONDUCTOR MANUFACTURING

Inventor: Louis A. Ollivier
Patented Case View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2011-04-05 COCOUT Certificate of Correction - Post Issue Communication 1 View
2010-08-13 COCIN Request for Certificate of Correction 2 View
2010-08-13 COCIN Request for Certificate of Correction 1 View
2010-08-13 N417 Electronic Filing System Acknowledgment Receipt 2 View
2002-02-06 TRNA Transmittal of New Application 2 View
2002-02-06 A.PE Preliminary Amendment 4 View
2002-02-06 SPEC Specification 36 View
2002-02-06 CLM Claims 12 View
2002-02-06 ABST Abstract 1 View
2002-02-06 DRW Drawings-only black and white line drawings 10 View
2002-02-06 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,450,200
App. No.
10/066,659
Filed
2002-02-06
Granted
2002-09-17
Pub. No.
US20020092564A1
Art Unit
3753
PTA
0 days