Granted Patent
Utility
US 6,680,263
· Confirmation No. 4366
METHOD FOR APPLYING A PHOTORESIST LAYER TO A SUBSTRATE HAVING A PREEXISTING TOPOLOGY
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2003-11-28 | IFEE |
Issue Fee Payment (PTO-85B) | 1 | View | |
| 2002-02-12 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-02-12 | SPEC |
Specification | 7 | View | |
| 2002-02-12 | CLM |
Claims | 3 | View | |
| 2002-02-12 | ABST |
Abstract | 1 | View | |
| 2002-02-12 | DRW |
Drawings-only black and white line drawings | 1 | View | |
| 2002-02-12 | OATH |
Oath or Declaration filed | 4 | View |
Inventors
Alfredo M. Morales
Livermore, CA
Marcela Gonzales
Seattle, WA
Attorneys & Agents of Record
Classification
USPC
438/781
G03F7/168
Prosecution
- Examiner
- VESPERMAN, WILLIAM C
- Art Unit
- 2813
- Customer No.
- 20567
- Docket No.
- SD-8258
- Confirmation No.
- 4366
Publication
- Pub. No.
- US20030152875A1
- Pub. Date
- 2003-08-14
Patent Term Adjustment
0days
No related applications found.
from
SANDIA CORPORATION
CHANGE OF NAME
Recorded 2017-11-03
from
SANDIA CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-25
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2002-10-24
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Quick Facts
- Patent No.
- US 6,680,263
- App. No.
- 10/074,195
- Filed
- 2002-02-12
- Granted
- 2004-01-20
- Pub. No.
- US20030152875A1
- Examiner
- VESPERMAN, WILLIAM C
- Art Unit
- 2813
- PTA
- 0 days
External Links