IP Library Granted Patent US 6,852,200
Granted Patent B2
US 6,852,200 · App. 10/076,361 · Granted Feb 8, 2005

Non-thermal plasma reactor gas treatment system

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Quick Facts
Patent No.
US 6,852,200
App. No.
10/076,361
Granted
Feb 8, 2005
Kind
B2
Abstract

A gas treatment system and method for using the same is disclosed. The gas treatment system, comprises: a non-thermal plasma reactor; and a catalyst composition disposed within said non-thermal plasma reactor, said catalyst composition comprising a MZr 4 (PO 4 ) 6 , wherein M is a metal selected from the group consisting of platinum, palladium, ruthenium, silver, rhodium, osmium, iridium, and combinations comprising at least one of said foregoing metals. The process comprises exposing said gas to a plasma field and to the catalyst composition.

Claims (28)

1. A process for treating exhaust gas, comprising:

exposing said gas to a plasma field; and

exposing said gas to a catalyst composition comprising MZr 4 (PO 4 ) 6 , where M is a metal selected from the group consisting of platinum, palladium, ruthenium, rhodium, osmium, silver, iridium, and alloys and combinations comprising at least one of said foregoing metals.

2. The process of claim 1 , wherein said catalyst composition further comprises 0.25 wt % to about 50 wt % of an oxidation catalyst, based upon a total weight of said catalyst composition.

3. The process of claim 2 , wherein said oxidation catalyst is selected from the group consisting of platinum, palladium, ruthenium, rhodium, osmium, iridium, gold, copper, silver, titanium, aluminum, gallium, indium, tin, and oxides, alloys, salts, and mixtures comprising at least one of said foregoing oxidation catalysts.

4. The process of claim 3 , further comprising exposing said gas to said MZr 4 (PO 4 ) 6 prior to exposing it to said oxidation catalyst.

5. The process of claim 4 , wherein said oxidation catalyst is disposed downstream from said plasma field.

6. The process of claim 1 , further comprising generating said plasma field in a non-thermal plasma reactor.

7. The process of claim 6 , wherein said non-thermal plasma reactor is a reactor selected from the group consisting of glow discharge reactor, RF discharge reactor, pulsed corona reactor, dielectric-barrier discharge reactor, electrified packed bed reactor, and surface discharge reactor.

8. The process of claim 7 , wherein said non-thermal plasma reactor is a pulsed corona reactor.

9. The process of claim 1 , wherein greater than or equal to about 66% of nitrogen oxides are removed.

10. The process of claim 9 , wherein greater than or equal to about 78% of nitrogen oxides are removed.

11. The process of claim 10 , wherein greater than or equal to about 90% of nitrogen oxides are removed.

12. The process of claim 1 , wherein said catalyst composition further comprises about 70 wt % to about 99 wt % of said MZr 4 (PO 4 ) 6 and about 1 wt % to about 30 wt % of an oxidation catalyst, based on a total weight of said catalyst composition.

13. The process of claim 12 , wherein said catalyst composition further comprises about 80 wt % to 98 wt % MZr 4 (PO 4 ) 6 and about 2 wt % to about 20 wt % of said oxidation catalyst, based on said total weight of said catalyst composition.

14. The process of claim 1 , further comprising exposing at least a portion of said gas to a catalytic converter.

15. The process of claim 1 , wherein said gas further comprises NO X .

16. A gas treatment system, comprising:

a non-thermal plasma reactor; and

a catalyst composition disposed within said non-thermal plasma reactor, said catalyst composition comprising a MZr 4 (PO 4 ) 6 , wherein M is a metal selected from the group consisting of platinum, palladium, ruthenium, silver, rhodium, osmium, iridium, and combinations comprising at least one of said foregoing metals.

17. The gas treatment system of claim 16 , wherein said non-thermal plasma reactor is a reactor selected from the group consisting of glow discharge reactor, RF discharge reactor, pulsed corona reactor, dielectric-barrier discharge reactor, electrified packed bed reactor, and surface discharge reactor.

18. The gas treatment system of claim 17 , wherein said non-thermal plasma reactor is a pulsed corona reactor.

19. The gas treatment system of claim 16 , wherein said catalyst composition further comprises an oxidation catalyst.

20. The gas treatment system of claim 19 , wherein said oxidation catalyst is selected from the group consisting of platinum, palladium, ruthenium, rhodium, osmium, iridium, gold, copper, silver, titanium, aluminum, gallium, indium, tin, and oxides, alloys, salts, and mixtures comprising at least one of said foregoing oxidation catalysts.

21. The gas treatment system of claim 16 , wherein said catalyst composition comprises about 70 wt % to about 99 wt % of said MZr 4 (PO 4 ) 6 and further comprises about 1 wt % to about 30 wt % of an oxidation catalyst, based on a total weight of said catalyst composition.

22. The gas treatment system of claim 21 , wherein said catalyst composition comprises about 80 wt % to 98 wt % of said MZr 4 (PO 4 ) 6 and about 2 wt % to about 20 wt % of said oxidation catalyst, based on said total weight of said catalyst composition.

23. The gas treatment system of claim 16 , further comprising a catalytic converter in fluid communication with said non-thermal plasma reactor.

24. The gas treatment system of claim 16 , further comprising an oxidation catalyst in fluid communication with said non-thermal plasma reactor, wherein said oxidation catalyst is selected from the group consisting of platinum, palladium, ruthenium, rhodium, osmium, iridium, gold, copper, silver, titanium, aluminum, gallium, indium, tin, and oxides, alloys, salts, and mixtures comprising at least one of said foregoing oxidation catalysts.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2007
From: ASEC MANUFACTURING GENERAL PARTNERSHIP
To: UMICORE AG & CO. KG
Reel/Frame 019930/0164 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 8, 2007
From: DELPHI TECHNOLOGIES, INC.
To: ASEC MANUFACTURING GENERAL PARTNERSHIP
Reel/Frame 019930/0042 →