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App. No. 10/103,687 · Confirmation No. 3408

ETCHING MASK, PROCESS FOR FORMING CONTACT HOLES USING SAME, AND SEMICONDUCTOR DEVICE MADE BY THE PROCESS

Inventor: Yasuhiko Ueda
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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2003-07-08 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-04-24 TRNA Transmittal of New Application 2 View
2002-04-24 DRW Drawings-only black and white line drawings 15 View
2002-03-25 TRNA Transmittal of New Application 4 View
2002-03-25 A.PE Preliminary Amendment 7 View
2002-03-25 SPEC Specification 36 View
2002-03-25 CLM Claims 4 View
2002-03-25 ABST Abstract 1 View
2002-03-25 DRW Drawings-only black and white line drawings 15 View
2002-03-25 OATH Oath or Declaration filed 3 View
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Quick Facts
App. No.
10/103,687
Filed
2002-03-25
Granted
2003-09-09
Pub. No.
US20020115310A1
Art Unit
2813
PTA
0 days