Laminate and process for producing the same

1. A laminate comprising a layer of polyimide or layers of polyimides formed on a conductor by coating, wherein at least one of said polyimide layers is a polyimide layer of low hygroscopic expansion obtained by the reaction of diamines containing 20 mol % or more of 4,4′-diamino-2,2′-dimethylbiphenyl with a tetracarboxylic acid compound and exhibiting a coefficient of linear hygroscopic expansion of 20×10 −6 /% RH or less.

2. The laminate as described in claim 1 , wherein the coefficient of linear hygroscopic expansion of the polyimide layer of low hygroscopic expansion is 15×10 −6 /% RH or less.

3. The laminate as described in claim 1 , wherein the polyimide layer has a multilayer structure composed of at least two layers, one being a polyimide layer of low hygroscopic expansion exhibiting a coefficient of linear hygroscopic expansion of 20×10 −6 /% RH or less, and the other being a polyimide layer of high thermal expansion exhibiting a coefficient of linear thermal expansion of 30×10 −6 /° C. or more, and wherein the polyimide of high thermal expansion is in contact with the conductor layer.

4. The laminate as described in claim 1 , wherein the polyimide layer has a three-layer structure composed of a polyimide layer of high thermal expansion, a polyimide layer of low hygroscopic expansion, and a polyimide layer of high thermal expansion.

5. The laminate as described in claim 1 , wherein the polyimide layer of low hygroscopic expansion is a layer of polyimide containing 20 mol % or more of the structural unit represented by the following formula (1) and/or formula (2)

6. The laminate as described in claim 1 , wherein the polyimide layer of low hygroscopic expansion further exhibits a coefficient of linear thermal expansion of 25×10 −6 /° C. or less.

7. The laminate as described in claim 1 , wherein the diamines contains 50 mol % or more of 4,4′-diamino-2,2′-dimethylbiphenyl.

8. The laminate as described in claim 3 , wherein the polyimide layer of high thermal expansion has a thickness of ⅓ or less of that of the resin layers as a whole.

9. A process for producing the laminate as described in claim 1 , which process comprises

coating a conductor with a solution of polyimide precursor or polyimide obtained by the reaction of diamines containing 20 mol % or more of 4,4′-diamino-2,2′-dimethylbiphenyl with a tetracarboxylic acid compound,

drying the solution, and

giving heat treatment at a temperature above 200° C. to form a polyimide layer of low hygroscopic expansion with a coefficient of linear humidity coefficient of 20×10 −6 /% RH or less on the conductor.

10. The process as described in claim 9 , which comprises

coating a conductor with a solution of resin precursor or resin capable of yielding polyimide of high thermal expansion with a coefficient of linear thermal expansion of 30×10 −6 /° C. or more and then with a solution of resin precursor or resin capable of yielding polyimide of low hygroscopic expansion with a coefficient of linear hygroscopic expansion of 20×10 −6 /% RH or less,

drying the solutions to form plural layers of resins, and

giving heat treatment at a temperature above 200° C. to form polyimide layers possessing at least one layer of polyimide of low hygroscopic expansion with a coefficient of linear hygroscopic expansion of 20×10 −6 /% RH or less.

11. A process for producing a double-sided laminate possessing conductors on both sides, which process comprises

coating a conductor with a solution of resin precursor or resin according to the process as described in claim 10 so that the polyimide of high thermal expansion constitutes the layer in contact with the conductor layer and the layer on the surface,

drying the solutions to form plural layers of resins,

giving heat treatment at a temperature above 200° C. to form a single-sided laminate possessing a conductor layer on one side, and

hot-pressing another conductor layer to the single-sided laminate.