Integrated lead suspension for use in a disk drive using a tri-metal laminate and method for fabrication
View Patent ↗An example of a multi-layer structure which may be used for supporting a transducer includes a support layer and an etch stop layer formed from a refractory metal on the support layer. A first electrically conducting layer of copper may be positioned on the etch stop layer. A dielectric layer may be provided on the first electrically conducting layer. A second electrically conducting layer of copper may be provided on the dielectric layer. The dielectric layer is positioned between the first electrically conducting layer and the second electrically conducting layer. The second electrically conducting layer may include a plurality of separate electrically conducting lines.
1. A laminate structure comprising:
a support layer;
an etch stop layer on the support layer, the etch stop layer having a thickness in the range of 250 to 5000 Angstroms;
a first electrically conducting layer in contact with the etch stop layer;
a dielectric layer on the first electrically conducting layer; and
a second electrically conducting layer on the dielectric layer;
wherein the etch stop layer is formed from a material having a different composition than that of the support layer, the first electrically conducting layer, the dielectric layer, and the second electrically conducting layer.
2. A laminate structure as in claim 1 , wherein the etch stop layer has a thickness in the range of 250 to 2000 Angstroms.
3. A laminate structure as in claim 1 , wherein the etch stop layer has a thickness in the range of 500 to 1000 Angstroms.
4. A laminate structure as in claim 1 , wherein the etch stop layer comprises a refractory metal.
5. A laminate structure as in claim 1 , wherein the etch stop layer comprises at least one material selected from the group consisting of molybdenum, tungsten, titanium and tantalum.
6. A laminate structure as in claim 1 , wherein the first conducting layer has a thickness that is less than that of the second conducting layer, and the etch stop layer has a thickness that is smaller than that of the dielectric material.
7. A laminate structure as in claim 1 , wherein the first and second electrically conducting layers each comprise copper.
8. A laminate structure as in claim 7 , wherein the first electrically conducting layer includes a higher percentage of copper than the second electrically conducting layer.
9. A laminate structure as in claim 8 , wherein the dielectric material comprises a polyimide and the support layer comprises stainless steel.
10. A laminate structure as in claim 1 , wherein the first electrically conducting layers is formed to have a thickness of 500 to 5000 Angstroms.
11. A laminated material as in claim 1 wherein the etch stop layer comprises a vacuum deposited material.
12. A laminate structure comprising:
a support layer;
an etch stop layer disposed on the support layer;
a first electrically conducting layer disposed on the etch stop layer;
a dielectric material disposed on the first electrically conducting layer; and
a second electrically conducting layer disposed on the dielectric layer, the dielectric layer being positioned between the first electrically conducting layer and the second electrically conducting layer;
wherein the etch stop layer is formed from a material having a different composition than that of the first electrically conductive layer and the second electrically conducting layer, and wherein the etch stop layer comprises a refractory metal.
13. A laminate structure as in claim 12 , wherein the etch stop layer comprises a material selected from the group consisting of molybdenum and tungsten.
14. A laminate structure as in claim 12 , wherein the etch stop layer comprises a material selected from the group consisting of molybdenum, tungsten, titanium and tantalum.
15. A laminate structure as in claim 12 ,
wherein the first electrically conducting layer is formed from pure copper;
the second electrically conducting layer is formed from a copper alloy;
the dielectric layer comprises a polyimide; and
the support layer comprises stainless steel.
16. A laminate structure as in claim 12 , wherein the first electrically conducting layer comprises a material selected from the group consisting of electroplated copper and vacuum deposited copper.
17. A laminate structure, comprising:
a support layer;
an etch stop layer disposed on the support layer;
a first electrically conducting layer disposed in contact with the etch stop layer;
a dielectric material disposed on the first electrically conducting layer; and
a second electrically conducting layer disposed on the dielectric layer, the dielectric layer being positioned between the first electrically conducting layer and the second electrically conducting layer;
wherein the etch stop layer is formed from a material having a different composition than that of the support layer, the first electrically conducting layer, the dielectric layer, and the second electrically conducting layer, and wherein the material has a lower electrical conductivity than that of the first electrically conducting layer and the second electrically conducting layer.
18. A laminate structure as in claim 17 , wherein the etch stop layer is formed from an insulating material.
19. A laminate structure as in claim 17 , wherein the etch stop layer is formed from a metallic material.
20. A laminate structure as in claim 17 , wherein the etch stop layer is formed from a material selected from the group consisting of molybdenum and tungsten.