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App. No. 10/139,379 · Confirmation No. 4318

PHOTOMASK, METHOD OF GENERATING RESIST PATTERN, AND METHOD OF FABRICATING MASTER INFORMATION CARRIER

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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2004-03-11 CTNF Non-Final Rejection 6 View
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2002-08-05 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2002-08-05 FOR Foreign Reference 13 View
2002-05-07 TRNA Transmittal of New Application 2 View
2002-05-07 SPEC Specification 22 View
2002-05-07 CLM Claims 14 View
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2002-05-07 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2002-05-07 SRFW Search information including classification, databases and other search related notes 1 View
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2002-05-07 SPEC Specification 22 View
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Quick Facts
App. No.
10/139,379
Filed
2002-05-07
Granted
2004-11-23
Pub. No.
US20020168839A1
Examiner
NHU, DAVID
Art Unit
2818
PTA
-3 days