Granted Patent
Utility
US 6,664,183
· Confirmation No. 8137
SHADOW MASK, A METHOD OF FORMING THE SHADOW MASK, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH USING THE SHADOW MASK
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2003-10-16 | IFEE |
Issue Fee Payment (PTO-85B) | 2 | View | |
| 2002-05-08 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-05-08 | A.PE |
Preliminary Amendment | 3 | View | |
| 2002-05-08 | SPEC |
Specification | 23 | View | |
| 2002-05-08 | CLM |
Claims | 3 | View | |
| 2002-05-08 | ABST |
Abstract | 1 | View | |
| 2002-05-08 | DRW |
Drawings-only black and white line drawings | 1 | View | |
| 2002-05-08 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-05-08 | A.PE |
Preliminary Amendment | 3 | View | |
| 2002-05-08 | SPEC |
Specification | 23 | View | |
| 2002-05-08 | CLM |
Claims | 3 | View | |
| 2002-05-08 | ABST |
Abstract | 1 | View | |
| 2002-05-08 | DRW |
Drawings-only black and white line drawings | 13 | View | |
| 2002-05-08 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Shinichi Fukuzawa
Tokyo, JAPAN
Shigeyoshi Ootsuki
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/640
C23C14/042
H10K59/35
H10K71/40
G03F7/12
Prosecution
- Examiner
- DANG, PHUC T
- Art Unit
- 2818
- Customer No.
- 58027
- Docket No.
- NECL 16.622A
- Confirmation No.
- 8137
Foreign Priority
301844/1998
·
1998-10-23
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JAPAN
Publication
- Pub. No.
- US20020125824A1
- Pub. Date
- 2002-09-12
Patent Term Adjustment
0days
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Quick Facts
- Patent No.
- US 6,664,183
- App. No.
- 10/141,129
- Filed
- 2002-05-08
- Granted
- 2003-12-16
- Pub. No.
- US20020125824A1
- Examiner
- DANG, PHUC T
- Art Unit
- 2818
- PTA
- 0 days
External Links