Granted Patent
Utility
US 6,627,097
· Confirmation No. 1111
SHADOW MASK, A METHOD OF FORMING THE SHADOW MASK, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE WITH USING THE SHADOW MASK
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-05-09 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-05-09 | A.PE |
Preliminary Amendment | 9 | View | |
| 2002-05-09 | SPEC |
Specification | 23 | View | |
| 2002-05-09 | CLM |
Claims | 3 | View | |
| 2002-05-09 | ABST |
Abstract | 1 | View | |
| 2002-05-09 | DRW |
Drawings-only black and white line drawings | 13 | View | |
| 2002-05-09 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Shinichi Fukuzawa
Tokyo, JAPAN
Shigeyoshi Ootsuki
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
216/49
C23C14/042
H10K59/35
H10K71/40
G03F7/12
Prosecution
- Examiner
- STEVENSON, ANDRE C
- Art Unit
- 2812
- Customer No.
- 58027
- Docket No.
- NECL 16.622B
- Confirmation No.
- 1111
Foreign Priority
301844/1998
·
1998-10-23
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JAPAN
Publication
- Pub. No.
- US20020135287A1
- Pub. Date
- 2002-09-26
Patent Term Adjustment
-120days
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Quick Facts
- Patent No.
- US 6,627,097
- App. No.
- 10/142,416
- Filed
- 2002-05-09
- Granted
- 2003-09-30
- Pub. No.
- US20020135287A1
- Examiner
- STEVENSON, ANDRE C
- Art Unit
- 2812
- PTA
- -120 days
External Links