Semiconductor device and method for manufacturing the same
View Patent ↗A method of manufacturing a semiconductor device comprising a plurality of single-crystal semiconductor layers formed, for example, in an opening of an insulating film, said semiconductor layers having no or very few crystal defects. The method comprises forming in a first growth chamber a first semiconductor layer of a first conductivity type in an opening of an insulating film and subsequently forming in a second growth chamber a second semiconductor layer of a second conductivity type in an opening of an insulating film, while supplying hydrogen to the surface of the substrate when the substrate is transferred from said first growth chamber to said second growth chamber.
1. An apparatus adapted to manufacture a semiconductor device with a plurality of semiconductor layers, comprising:
a first growth chamber;
a second growth chamber; and
a transfer chamber connecting the first growth chamber to the second growth chamber, said transfer chamber including a hydrogen gas source adapted to provide hydrogen gas to the semiconductor device when the device is in the transfer chamber, wherein vacuum rates of the first growth chamber, the second growth chamber and the transfer chamber are no higher than 1×10 −5 Pa.
2. The apparatus according to claim 1 , further comprising:
a cleaning chamber connected to said transfer chamber, wherein a vacuum rate of the cleaning chamber is no higher than 1×10 −5 Pa.
3. The apparatus according to claim 2 , wherein said cleaning chamber is adapted to heat said device in the presence of hydrogen.
4. The apparatus according to claim 1 , wherein said first and second growth chambers are adapted to heat the device in the presence of hydrogen to clean the surface of the device before forming semiconductor layers thereon.
5. The apparatus of claim 4 , wherein said hydrogen is elemental hydrogen.