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App. No. 10/152,809 · Confirmation No. 6924

Phase shift mask and design method therefor

Inventor: Satsuki Tanaka
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2004-11-26 ABN Abandonment 2 View
2004-02-19 CTNF Non-Final Rejection 5 View
2004-02-19 892 List of references cited by examiner 1 View
2004-02-19 SRFW Search information including classification, databases and other search related notes 1 View
2004-02-09 SRNT Examiner's search strategy and results 2 View
2002-05-23 TRNA Transmittal of New Application 2 View
2002-05-23 A.PE Preliminary Amendment 5 View
2002-05-23 SPEC Specification 57 View
2002-05-23 CLM Claims 8 View
2002-05-23 ABST Abstract 1 View
2002-05-23 DRW Drawings-only black and white line drawings 12 View
2002-05-23 OATH Oath or Declaration filed 3 View
2002-05-23 WFEE Fee Worksheet (SB06) 1 View
2002-05-23 WFEE Fee Worksheet (SB06) 1 View
2002-05-23 FRPR Certified Copy of Foreign Priority Application 67 View
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Quick Facts
App. No.
10/152,809
Filed
2002-05-23
Pub. No.
US20020177050A1
Art Unit
1756