IP Library › Granted Patent US 6,756,168
Granted Patent Utility
US 6,756,168 · Confirmation No. 3064

DETERMINING EXPOSURE TIME OF WAFER PHOTOLITHOGRAPHY PROCESS

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2012-03-22 LET. Miscellaneous Incoming Letter 2 View
2012-03-22 N417 Electronic Filing System Acknowledgment Receipt 2 View
2008-12-31 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2008-12-31 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2008-12-19 PA.. Power of Attorney 2 View
2008-12-19 N417 Electronic Filing System Acknowledgment Receipt 2 View
2004-05-19 IFEE Issue Fee Payment (PTO-85B) 1 View
2004-03-16 NOA Notice of Allowance and Fees Due (PTOL-85) 3 View
2004-03-16 NOA Notice of Allowance and Fees Due (PTOL-85) 2 View
2004-03-16 892 List of references cited by examiner 1 View
2004-03-16 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2004-03-16 SRFW Search information including classification, databases and other search related notes 1 View
2002-08-12 TRNA Transmittal of New Application 2 View
2002-08-12 SPEC Specification 13 View
2002-08-12 CLM Claims 4 View
2002-08-12 ABST Abstract 1 View
2002-08-12 DRW Drawings-only black and white line drawings 4 View
2002-08-12 OATH Oath or Declaration filed 2 View
2002-08-12 WFEE Fee Worksheet (SB06) 1 View
2002-08-12 WFEE Fee Worksheet (SB06) 1 View
2002-08-12 FRPR Certified Copy of Foreign Priority Application 35 View
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Quick Facts
Patent No.
US 6,756,168
App. No.
10/218,376
Filed
2002-08-12
Granted
2004-06-29
Pub. No.
US20030036270A1
Art Unit
1756
PTA
0 days