IP Library › Granted Patent US 6,686,120
Granted Patent Utility
US 6,686,120 · Confirmation No. 8480

PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

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2003-09-22 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-09-22 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
2003-09-22 CLM Claims 7 View
2003-09-22 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2002-08-15 TRNA Transmittal of New Application 5 View
2002-08-15 SPEC Specification 33 View
2002-08-15 CLM Claims 7 View
2002-08-15 ABST Abstract 1 View
2002-08-15 DRW Drawings-only black and white line drawings 6 View
2002-08-15 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,686,120
App. No.
10/219,711
Filed
2002-08-15
Granted
2004-02-03
Pub. No.
US20030134222A1
Art Unit
1752
PTA
-66 days