IP Library Granted Patent US 7,976,762
Granted Patent B2
US 7,976,762 · App. 10/219,824 · Granted Jul 12, 2011

Method for microstructing polymer-supported materials

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Quick Facts
Patent No.
US 7,976,762
App. No.
10/219,824
Granted
Jul 12, 2011
Kind
B2
Abstract

A method is provided for microstructuring polymer-supported materials. Also provided are microstructured objects obtained with this method. The microstructured objects are suitable for use, among other things, as light polarizers, transflectors, microelectrode arrays, and liquid-crystal alignment layers.

Claims (5)

1. A process of forming an array of microelectrodes comprising:

pressing a master into a multi-layered structure,

said master having a surface facing said multi-layered structure, said surface comprising an area having a protruding micro-structured pattern comprising tapered features defining protruding edges,

said multi-layered structure comprising at least one supporting layer that entirely remains in the solid state during pressing, and formed directly on said supporting layer, and positioned between said master and said at least one supporting layer, a metal layer,

wherein at least said edges of said tapered features of said micro-structured pattern penetrate through said metal layer into said at least one supporting layer, so as to form an array of microelectrodes.

Assignments (2)
RELEASE OF SECURITY INTEREST Recorded May 12, 2011
From: STATE CORPORATION "RUSSIAN CORPORATION OF NANOTECHNOLOGIES"
To: PLASTIC LOGIC LIMITED
Reel/Frame 026271/0377 →
SECURITY AGREEMENT Recorded Aug 3, 2010
From: PLASTIC LOGIC LIMITED
To: STATE CORPORATION "RUSSIAN CORPORATION OF NANOTECHNOLOGIES"
Reel/Frame 024776/0357 →