Process of thinning and blunting semiconductor wafer edge and resulting wafer
View Patent ↗A wafer having a rounded edge is thinned to 100 microns or less, producing a tapered razor like edge. The edge is ground to blunt it and reduce danger to personnel and equipment during handling of the wafer.
1. A semiconductor device wafer comprising:
a semiconductor wafer sliced from a drawn ingot, said sliced wafer having a first major surface, a second major surface opposing said first major surface, and a thickness less than 100 microns;
individual semiconductor die residing at said first major surface of said wafer;
blunt peripheral edge extending between said first major surface and said second major surface, wherein said edge is perpendicular to said first and second major surfaces.
2. A semiconductor device wafer according to claim 1 ,wherein said peripheral edge is rounded.
3. A semiconductor device wafer according to claim 1 , wherein an angle between at least one of said major surfaces and said peripheral edge is more than 45 degrees.
4. A semiconductor device wafer according to claim 1 , wherein said semiconductor wafer is comprised of monocrystalline silicon.
5. A semiconductor device wafer according to claim 1 , wherein said semiconductor wafer is ground from an initial thickness to said thickness of 100 microns after formation of said individual semiconductor die.
6. A semiconductor device wafer according to claim 5 , wherein a relief etch is applied after said wafer is ground to relieve said ground surface.
7. A semiconductor device wafer according to claim 5 , wherein said initial thickness is between 300 microns to 600 microns.
8. A semiconductor device wafer according to claim 1 , wherein said peripheral edge is mechanically shaped by grinding.
9. A semiconductor device wafer comprising:
a semiconductor wafer sliced from a drawn ingot, said sliced wafer having a first major surface, a second major surface opposing said first major surface, and a thickness less than 100 microns;
individual semiconductor die residing at said first major surface of said wafer;
mechanically shaped peripheral edge extending between said first major surface and said second major surface, wherein said peripheral edge is blunted by said mechanical shaping of said peripheral surface and wherein said edge is perpendicular to said first and second major surfaces.
10. A semiconductor device wafer according to claim 9 , wherein said mechanically shaped peripheral edge is rounded.
11. A semiconductor device wafer according to claim 9 , wherein an angle between at least one of said major surfaces and said peripheral edge is more than 45 degrees.
12. A semiconductor device wafer according to claim 9 , wherein said semiconductor wafer is comprised of monocrystalline silicon.
13. A semiconductor device wafer according to claim 9 , wherein said semiconductor wafer is ground from an initial thickness to said thickness of 100 microns after formation of said individual semiconductor die.
14. A semiconductor device wafer according to claim 13 , wherein a relief etch is applied after said wafer is ground to relieve said ground surface.
15. A semiconductor device wafer according to claim 13 , wherein said initial thickness is between 300 microns to 600 microns.
16. A semiconductor device wafer according to claim 9 , wherein said peripheral edge is mechanically shaped by grinding.