Optical component having waveguides extending from a common region
View Patent ↗A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.
1. A method of forming an optical component, comprising:
forming a first mask on an optical component precursor, the first mask including a plurality of waveguide portions each positioned to protect a waveguide region of the optical component precursor where a waveguide is to be formed extending from a common region;
forming a second mask on the optical component precursor such that the second mask is at least partially positioned between waveguide portions of the first mask, a resistance of the second mask to etching varying along at least one dimension of the second mask, and the second mask being formed non-simultaneously with the first mask; and
etching the optical component precursor with the first mask and the second mask in place on the optical component precursor so as to form the waveguides extending from the common region concurrently with forming a tapered region between the waveguides, the tapered region formed with a thickness that tapers in a direction moving away from the common region.
2. The method of claim 1 , wherein the tapered region is connected to the common region.
3. The method of claim 1 , wherein the etching is performed such that the etch does not etch through the first mask.
4. The method of claim 1 , wherein the etching is performed so as to etch through the second mask for at least a portion of the second mask.
5. The method of claim 1 , wherein the second mask has a thickness that varies along at least one dimension of the second mask.
6. The method of claim 1 , wherein forming the second mask includes exposing a second mask precursor to light through a gray scale region of a photomask.
7. The method of claim 1 , wherein the first mask and the second mask are formed so as to at least partially overlap one another.
8. The method of claim 1 , wherein the second mask is formed so as to overlap portions of the first mask.
9. The method of claim 1 , wherein the etching is performed such that the etch does not etch through the first mask and etches through the second mask for at least a portion of the second mask.
10. A method of forming an optical component, comprising:
forming a first mask on an optical component precursor, the first mask including a plurality of waveguide portions each positioned to protect a waveguide region of the optical component precursor where a waveguide is to be formed;
forming a second mask on the optical component precursor so as to protect a region of the optical component precursor positioned between the waveguide regions of the optical component precursor, a resistance of the second mask to etching varying along at least one dimension of the second mask, and the second mask being formed non-simultaneously with the first mask; and
etching the optical component precursor with the first mask and the second mask in place on the optical component precursor so as to form the waveguides concurrently with forming a tapered region between the waveguides, the tapered region formed with a thickness that tapers.
11. The method of claim 10 , wherein the etching is performed such that the etch does not etch through the first mask.
12. The method of claim 10 , wherein the etching is performed so as to etch through the second mask for at least a portion of the second mask.
13. The method of claim 10 , wherein the second mask has a thickness that varies along at least one dimension of the second mask.
14. The method of claim 10 , wherein forming the second mask includes exposing a second mask precursor to light through a gray scale region of a photomask.
15. The method of claim 10 , wherein the first mask and the second mask are formed so as to at least partially overlap one another.
16. The method of claim 10 , wherein the second mask is formed so as to overlap portions of the first mask.
17. The method of claim 10 , wherein at least a portion of the second mask is positioned between the waveguide portions of the first mask.
18. The method of claim 10 , wherein the first masks is formed so as to protect a common region of the optical component precursor where a common region is to be formed such that the waveguides extend from the common region.
19. The method of claim 10 , wherein the first mask include a common region portion arranged such that the waveguide portions extend from the common region portion.
20. The method of claim 10 , wherein the etching is performed such that the etch does not etch through the first mask and etches through the second mask for at least a portion of the second mask.
21. The method of claim 1 , wherein the second mask is of a different type than the first mask.
22. The method of claim 1 , wherein the first mask is a hard mask.