Process for making light waveguide element
View Patent ↗A process for making a light waveguide element is made by forming only an upper clad layer ( 40 ) and a core layer ( 32 ) without etching an optical axis height-adjusting sections. By using plasma chemical vapor deposition (CVD) which is good at controlling the film thickness, it is possible to provide without difficulty a light waveguide element with a height-adjusting section that has a precise film thickness, making it possible to provide precise optical axis vertical alignment upon mounting. By forming alignment markers in the same photolithography as that of the core formation, it is possible to provide precise horizontal optical axis alignment.
1. A process for making a light waveguide element mounted on a mount board along with an optical fiber and photoelectric components, comprises:
forming a core as a light path on a substrate serving as a lower clad layer; and
forming a T-shaped upper clad layer having a central section elevated from optical axis height-adjusting side sections to cover said core, wherein said T-shaped upper clad layer-forming step comprises:
patterning, subsequent to said core-forming step, an etching stopper film on opposite sides of said core including an area of said optical axis height-adjusting side sections;
forming a first upper clad layer over an entire surface including said etching stopper film, said core, and said substrate;
forming an etching mask on said first upper clad layer so as to cover an area above said core;
etching off a portion of said first upper clad layer that is other than said area covered by said etching mask until said etching stopper film is exposed;
removing said etching stopper film and said etching mask; and
forming a second upper clad layer over an entire surface including said first upper clad layer and said substrate.
2. The process according to claim 1 , wherein said T-shaped upper clad layer is made sufficiently thick to provide light propagation characteristics.
3. The process according to claim 2 , wherein said T-shaped upper clad layer is made 15 μm thick or more.
4. The process according to claim 1 , wherein said optical axis height-adjusting side sections are made so as to have a thickness from said lower clad layer equal to a sum of a half of a thickness of said core and an optical axis height of said optical fiber and said photoelectric components.
5. The process according to claim 1 , wherein said core and said upper clad layer are made by plasma chemical vapor deposition.