IP Library › Granted Patent US 6,992,282
Granted Patent B2
US 6,992,282 · App. 10/242,954 · Granted Jan 31, 2006

Use of a nebulizer to add gas to eliminate metal deposition on the sampling orifices of an inductively coupled plasma mass spectrometer

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Quick Facts
Patent No.
US 6,992,282
App. No.
10/242,954
Granted
Jan 31, 2006
Kind
B2
Abstract

Use of a nebulizer add-gas to reduce metal deposition on the sampling orifices of an inductively coupled plasma mass spectrometer (“ICP-MS”) is disclosed. Specifically, dilute mixtures of Sulfur Hexafluoride (SF 6 ) in an inert gas have been used to reduce transition metal deposition on the sampling orifices of an ICP-MS, thereby greatly enhancing the stability of the ICP-MS sensitivity over time without corroding the internal parts and/or chemically attacking the cones of the ICP-MS.

Claims (9)

1. A method of reducing sample deposition on the sampling orifices of an inductively coupled plasma mass spectrometer having a nebulizer, the method comprising:

providing an inductively coupled plasma mass spectrometer having a nebulizer; and

introducing a nebulizer add-gas into the nebulizer, the add-gas comprising SF 6 .

2. The method described in claim 1 , wherein the SF 6 concentration in the add-gas is between about 5 ppm and about 1000 ppm.

3. The method described in claim 2 , wherein the SF 6 concentration in the add-gas is between about 5 ppm and about 500 ppm.

4. The method described in claim 1 , wherein the SF 6 concentration in the add-gas is between about 5 ppm and about 10 ppm.

5. The method described in claim 1 , wherein the SF 6 concentration in the add-gas is between about 10 ppm and about 1000 ppm.

6. The method described in claim 5 , wherein the SF 6 concentration in the add-gas is between about 10 ppm and about 500 ppm.

7. The method described in claim 6 , wherein the SF 6 concentration in the add-gas is between about 10 ppm and about 100 ppm.