Apparatus and method for bending and/or tempering glass
View Patent ↗An apparatus and method for bending and/or tempering glass substrate(s) are provided. The amount of near-IR radiation which reaches the glass to be bent and/or tempered is limited (e.g., via filtering or any other suitable technique). Thus, the IR radiation (used for heating the glass) which reaches the glass to be bent and/or tempered includes mostly mid-IR and/or far-IR radiation, and not much near-IR. In such a manner, coating(s) provided on the glass can be protected and kept at lower temperatures so as to be less likely to be damaged during the bending and/or tempering process. Heating efficiency can be improved. A ceramic (e.g., aluminosilicate) filter or baffle may be used in certain embodiments in order to reduce the amount of mid-IR and/or far-IR radiation reaching the glass to be tempered and/or bent.
1. An apparatus for bending and/or tempering a glass substrate, the apparatus comprising:
a bending mold for supporting the glass substrate during bending and/or tempering;
a heating element for generating heat; and
a near-IR filter comprising a ceramic inclusive radiating surface located between the heating element and the glass substrate to be bent and/or tempered, the near-IR filter for reducing the amount of near-IR radiation that reaches the glass substrate to be bent and/or tempered during the process of bending and/or tempering the glass substrate when the glass substrate is supported by the bending mold.
2. The apparatus of claim 1 , wherein the near-IR filter comprises a silicate.
3. The apparatus of claim 1 , wherein the near-IR filter comprises aluminosilicate.
4. The apparatus of claim 1 , wherein an emitting portion of the near-IR filter has an emissivity of at least about 0.4 at all IR wavelengths from 5 to 8 μm, and an emissivity of less than 0.45 at all wavelengths from 0.9 to 3 μm.
5. The apparatus of claim 1 , wherein an emitting portion of the near-IR filter has an emissivity of at least about 0.4 for at least some IR wavelengths in the range of from 5 to 8 μm, and an emissivity of less than 0.45 for all wavelengths from 0.9 to 3 μm.
6. The apparatus of claim 5 , wherein the emitting portion of the near-IR filter has an emissivity of at least about 0.7 for at least some IR wavelengths in the range of from 5 to 8 μm, and an emissivity of less than 0.35 for all wavelengths from 0.9 to 3 μm.
7. The apparatus of claim 1 , wherein the near-IR filter is spaced from the heating element and filters out at least about 30% of near-IR radiation received by the filter from the heating element.
8. The apparatus of claim 7 , wherein the near-IR filter filters out at least about 50% of near-IR radiation received by the filter from the heating element.
9. The apparatus of claim 1 , wherein IR radiation output from the near-IR filter which reaches and heats the glass substrate comprises less than about 50% near-IR radiation with the remainder of the IR radiation which reaches the glass substrate being in the mid-IR and/or far-IR ranges.
10. The apparatus of claim 1 , wherein IR radiation output from the near-IR filter which reaches and heats the glass substrate comprises less than about 30% near-IR radiation with the remainder of the IR radiation which reaches the glass substrate being in the mid-IR and/or far-IR ranges.
11. The apparatus of claim 1 , wherein IR radiation output from the near-IR filter which reaches and heats the glass substrate comprises from 0–10% near-IR radiation with the remainder of the IR radiation which reaches the glass substrate being in the mid-IR and/or far-IR ranges.
12. The apparatus of claim 1 , wherein at least the IR radiation output from the near-IR filter heats the glass substrate to a temperature of at least 550 degrees C.
13. The apparatus of claim 1 , further comprising another near-IR filter, wherein the near-IR filters are on opposite sides of the glass substrate.
14. The apparatus of claim 1 , wherein the near-IR filter is in contact with the heating element.
15. An apparatus for bending and/or tempering a coated glass substrate, the apparatus comprising:
means for bending and/or tempering the coated glass substrate, the means including a heating element and a radiating surface comprising ceramic;
wherein the radiating surface comprising ceramic is located between the heating element and the coated glass substrate, the radiating surface comprising ceramic for directing radiation toward the coated glass substrate in order to heat the coated glass substrate for bending and/or tempering in a manner so as to reduce the amount of near-IR radiation that reaches the coated glass substrate to be bent and/or tempered.
16. The apparatus of claim 15 , wherein the radiating surface comprises a silicate.
17. The apparatus of claim 15 , wherein the radiating surface comprises aluminosilicate.
18. The apparatus of claim 1 , wherein the near-IR filter comprises a radiating surface comprising ceramic fibers.
19. The apparatus of claim 1 , wherein there is no heating structure between the radiating surface and the glass substrate to be bent and/or tempered.
20. An apparatus for bending a coated glass substrate, the apparatus comprising:
a bending structure for supporting the glass substrate during bending thereof;
a heating element; and
a radiating surface comprising ceramic located between the heating element and the coated glass substrate, the ceramic radiating surface for directing radiation toward the coated glass substrate in order to heat the coated glass substrate for bending the glass substrate that is supported by the bending structure.
21. The apparatus of claim 20 , wherein the radiating surface comprises ceramic fibers.
22. The apparatus of claim 20 , wherein there is no heating structure between the radiating surface and the coated glass substrate to be bent.