Anionic phthalic acid ester compounds and stain resistant compositions
View Patent ↗This invention relates to compounds of formula: wherein A is an unsaturated alkylene moiety; B the residue of a polyol wherein one hydroxyl moiety is esterified with one carboxyl moiety of the phthalic acid moiety; D is the residue of a polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the phthalic acid moiety, and another hydroxyl moiety is esterified with one carboxyl moiety of the unsaturated alkylene moiety; E is the residue of polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the unsaturated alkylene moiety; and M is a cation. The compounds can be used alone, or polymerized, or polymerized and combined with other polymers, to form effective stain and soil repellent compositions.
1. A compound having the formula 1:
wherein A is an unsaturated alkylene moiety; B is the residue of a substituted or unsubstituted polyol wherein one hydroxyl moiety is esterified with one carboxyl moiety of the phthalic acid moiety; D is the residue of a substituted or unsubstituted polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the phthalic acid moiety, and another hydroxyl moiety is esterified with one carboxyl moiety of the unsaturated alkylene moiety; E is the residue of a substituted or unsubstituted polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the unsaturated alkylene moiety; and M is a cation.
2. The compound of claim 1 , wherein the unsaturated alkylene moiety has between 2 and 6 carbon atoms.
3. The compound of claim 2 , wherein the unsaturated alkylene moiety is straight chain.
4. The compound of claim 3 , wherein the unsaturated alkylene moiety has two carbons.
5. The compound of claim 1 , wherein the substituted or unsubstituted polyol residue is a diol residue that is linear, linear branched, or cyclic.
6. The compound of claim 5 , wherein the substituted or unsubstituted polyol residue contains between 2 and 8 carbons.
7. The compound of claim 6 , wherein the substituted or unsubstituted polyol residue is an n-hexanediol,neopentyl glycol or cyclohexanedimethanol residue.
8. The compound of claim 1 , wherein B, D, and E are formed from the same polyol.
9. The compound of claim 8 , wherein B, D, and E are each —(CH 2 ) 6 —.
10. The compound of claim 1 , having formula II:
11. A stain resist composition comprising an effective amount of at least one compound of claim 1 .
12. The stain resist composition of claim 11 , further comprising a blend with one or more;
phenol formaldehyde condensation polymers, polymethacrylic acid, styrene-maleic acid polymers, or poly(meth)acrylic acid IPN with phenol-formaldehyde condensation polymers.
13. A method of imparting stain resistance to fabric or fiber, comprising contacting the fabric or fiber with the compound of claim 1 .
14. A method of imparting stain resistance to fabric or fiber, comprising contacting the fabric or fiber with the composition of claim 12 .