Composition and method for removing copper-compatible resist
View Patent ↗A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
1. A composition for removing a copper-compatible resist, comprising:
about 10% to about 30% by weight of an amine compound;
a glycolether compound; and
a polar solvent,
wherein the glycolether compound has a molecular weight of less than about 150, and the polar solvent includes at least one of N-methyl-2-pyrrolidinone, N,N-dimethylacetamide, N,N-dimethylformamide, and N,N-dimethylimidazole; and
wherein at least one of the glycolether compound and the polar solvent is about 45% by weight.
2. The composition according to claim 1 , wherein the amine compound includes at least one of N-methylethanolamine, N-ethylethanolamine, diethylethanolamine and dimethylethanolamine.
3. The composition according to claim 1 , wherein the glycolether compound includes at least one of ethyleneglycolethylether, ethyleneglycolmethylether, ethyleneglycolbutylether, diethyleneglycolbutylether, diethyleneglycolethylether, diethyleneglycolmethylether and diethyleneglycolpropylether.
4. The composition according to claim 3 , wherein the glycolether compound has a boiling point more than about 180°C.
5. The composition according to claim 1 , wherein the amine compound includes N-methylethanolamine, the glycolether compound includes at least one of diethyleneglycolethylether and diethyleneglycolpropylether, and the polar solvent includes N-methyl-2-pyrrolidinone.