Method for fabricating a thin film bulk acoustic wave resonator (FBAR) on a glass substrate
View Patent ↗A method for fabricating a Thin Film Bulk Acoustic Wave Resonator (FBAR). The method comprises the steps of: (A) forming a sacrificial layer comprising one of a metal and a polymer over a selected portion of a substrate; (B) forming a protective layer on the sacrificial layer and on selected portions of the substrate; (C) forming a bottom electrode layer on a selected portion of the protective layer; (D) forming a piezoelectric layer on a selected portion of the bottom electrode layer and on a selected portion of the protective layer; (E) forming a top electrode on a selected portion of the piezoelectric layer; and (F) removing the sacrificial layer to form an air gap. The use of a metal or a polymer material to form sacrificial layers has several advantages over the use of zinc-oxide (ZnO) to form such layers. In accordance with a further aspect of the invention, an FBAR is provided which includes a glass substrate. The use of glass to form substrates offers several advantages over the use of other materials to form substrates. By example, most types of glass are less expensive than semiconductor materials, and exhibit low permittivity characteristics, and low parasitic capacitances. In addition, most glass materials are substantially loss free when being used in microwave frequency applications.
1. A method for fabricating a Thin Film Bulk Acoustic Wave Resonator (FBAR), comprising the steps of:
STEP A: forming a sacrificial layer on a selected portion of a substrate, wherein the sacrificial layer comprises one of a metal and a polymer;
STEP B: forming a bottom electrode layer on the sacrificial layer and on selected portions of the substrate;
STEP C: forming a piezoelectric layer on a selected portion of the bottom electrode layer and on a selected portion of the substrate;
STEP D: forming a top electrode layer on a selected portion of the piezoelectric layer;
STEP E: removing the sacrificial layer to form an air gap beneath at least a portion of the bottom electrode layer;
wherein STEP A is performed by the steps of
STEP 1: depositing one of the metal and the polymer over the substrate; and
STEP 2: patterning the deposited one of the metal and the polymer to form the sacrificial layer;
wherein STEP E is performed by etching the sacrificial layer using a chemical that is not harmful to the piezoelectric layer; and
wherein between the performances of STEPS D and E, a step is performed of:
forming at least one via through at least one of the layers formed in STEPS B-D so that the sacrificial layer can be removed through the at least one via, thereby forming an RF resonator.
2. A method as set forth in claim 1 , wherein STEP A is performed by the steps of:
STEP 1: depositing the metal over the substrate; and
STEP 2: patterning the deposited metal to form the sacrificial layer.
3. A method as set forth in claim 2 , wherein the sacrificial layer has a thickness of about 2000 nm.
4. A method as set forth in claim 2 , wherein the metal is comprised of copper (Cu).
5. A method as set forth in claim 1 , wherein STEP A is performed by the steps of:
STEP 1: spinning the polymer onto the substrate; and
STEP 2: patterning the polymer to form the sacrificial layer.
6. A method as set forth in claim 5 , wherein the sacrificial layer has a thickness of about 1000 nm.
7. A method as set forth in claim 1 , wherein the protective layer comprises SiO 2 having a thickness of about 300 nm.
8. A method as set forth in claim 1 , wherein the bottom electrode layer comprises an electrically conductive metal having a thickness of about 300 nm.
9. A method as set forth in claim 1 , wherein the piezoelectric layer comprises zinc-oxide (ZnO) having a thickness of about 2000 nm.
10. A method as set forth in claim 1 , wherein the top electrode layer is comprised of an electrically conductive metal having a thickness of about 300 nm.
11. A method as set forth in claim 1 , wherein the sacrificial layer is formed of metal, and wherein STEP E is performed by wet etching the sacrificial layer.
12. A method as set forth in claim 1 , wherein the sacrificial layer is formed of the polymer, and wherein STEP E is performed by one of the steps of etching the sacrificial layer and plasma ashing the sacrificial layer.
13. A method as set forth in claim 1 , wherein the polymer material can survive the performance of STEP C at an elevated temperature.
14. A method as set forth in claim 1 , wherein the substrate is comprised of a solid material.
15. A method as set forth in claim 1 , wherein STEP E is performed between the performances of STEP B and STEP C.
16. A method as set forth in claim 1 , wherein the piezoelectric layer comprises zinc-oxide (ZnO) having a thickness that is a function of a desired resonant frequency of the FBAR.
17. A method as set forth in claim 1 , wherein the substrate is comprised of a glass.