IP Library Granted Patent US 7,029,507
Granted Patent B2
US 7,029,507 · App. 10/292,263 · Granted Apr 18, 2006

Polishing using multi-metal oxide nanopowders

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Quick Facts
Patent No.
US 7,029,507
App. No.
10/292,263
Granted
Apr 18, 2006
Kind
B2
Abstract

Polishing powders of nanoscale dimensions are disclosed. Complex, multi-metal oxides are disclosed as constituents for chemical mechanical planarization, (CMP) as well as polishes for optical components, photonic devices, and other applications.

Claims (23)

1. A process of producing a polishing slurry comprising:

providing a feed composition wherein the feed composition comprises a blend of a first fluid precursor and a second fluid precursor, wherein the first fluid precursor comprises of the first metal and the second fluid precursor comprises of the second metal;

introducing the feed composition into a reactor wherein the feed composition is converted into a vapor at a temperature greater than 3000 C;

transforming the vapor into polishing powder; and

dispersing the polishing powder in a solvent to form the polishing slurry.

2. The process of claim 1 , where the temperature at which the feed composition is converted into a vapor is greater than 5000 C.

3. The process of claim 1 , wherein the polishing powder comprises a submicron powder.

4. The process of claim 1 , wherein the polishing powder comprises a nanoscale powder.

5. The process of claim 1 , wherein the purity of the powder is greater than 99.9% on metal basis.

6. The process of claim 1 , wherein the purIty of the powder is greater than 99.99% on metal basis.

7. The process of claim 1 , wherein the powder comprises of an oxygen containing substance.

8. The process of claim 1 , wherein the powder comprises a silicate.

9. The process of claim 1 , wherein the powder is non-stoichiometric.

10. The process of claim 1 further comprising pretreating the polishing powder before forming the polishing slurry, wherein the pretreating comprises one or more process(cs) selected from the group consisting of: thermal treatment, surface modification, shear mixing, and sonication.

11. The process of claim 1 further comprising combining one or more additives wIth the polishing slurry wherein the additives are selected from the group consisting of: acids, alkalis, detergents, oxidizers, reducers, dispersants, catalysts, enzymes, and emulsifying agents.

12. The process of claim 1 , wherein the blend further comprises of additional fluid precursors.

13. A method for producing a polishing slurry comprising:

preparing nanoparticles with a composition comprising at least two metals selected from the group comprising: aluminum, silicon, copper, cerium, zirconium, rare earth, alkaline earth, tungsten, titanium, iron, nickel, cobalt, zinc, tin, boron, platinum, palladium, silver, gold, hafnium, and manganese, wherein the preparing comprises introducing the composition into a reactor wherein the composition is converted into a vapor at a temperature greater than 3000 C and transforming the vapor into the nanoparticles;

wherein the hardness of the nanoparticles with a composition comprising at least two metals is different than the hardness of single metal oxides of alumina and silica;

dispersing the nanoparticles in water or organic solvent; and

adding additional additives thereby preparing a polishing slurry.

14. The method of claim 13 wherein the nanoparticles with a composition comprising at least two metals comprises a multi-metal oxide.

15. The method of claim 13 wherein the additional additives are selected from the group consisting of: acids, alkalis, detergents, oxIdizers, reducers, dispersants. catalysts, enzymes, and emulsifying agents.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2008
From: NANOPRODUCTS CORPORATION
To: PPG INDUSTRIES OHIO, INC.
Reel/Frame 020540/0506 →
RELEASE OF SECURITY INTEREST Recorded Jan 29, 2008
From: KOCH NANOMATERIALS, LLC, BY KOCH GENESIS COMPANY, LLC
To: NANOPRODUCTS CORPORATION
Reel/Frame 020417/0791 →
SECURITY AGREEMENT Recorded Jun 27, 2007
From: NANOPRODUCTS CORPORATION
To: KOCH NANOMATERIALS, LLC, BY KOCH GENESIS COMPANY, LLC
Reel/Frame 019477/0836 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2002
From: YADAV, TAPESH; PFAFFENBACH, KARL
To: NANOPRODUCTS CORPORATION
Reel/Frame 013489/0995 →