Star-branched silicone polymers as anti-mist additives for coating applications
View Patent ↗A hydrido-silicone is incompletely reacted with (preferably) a long chain olefin under hydrosilylation conditions to produce a partially substituted hydrido-silicone that is further reacted under hydrosilylation conditions with a vinyl containing MQ resin to partially consume the remaining hydride species which is then reacted under hydrosilylation conditions to consume the remaining hydride species with a long chain olefin to produce a composition that is useful as an anti-mist agent in the coating of flexible supports.
1. A composition to reduce misting during the coating of flexible supports comprising the hydrosilylation reaction product of:
a) M a M H b D c D H d T e T H f ; and
b) an amount α of CH 2 ═CHR 1
where α+1≦b+d+f; 1.5≦b+d+f≦100; 2≦a+b≦12; 0≦c+d≦1000; 0≦e+f≦10 and R 1 is a monovalent radical selected from the group consisting of halogens, hydrogen, C5 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, and mixtures thereof; where
M=R 2 R 3 R 4 SiO 1/2 ;
M H =HR 5 R 6 SiO 1/2 ;
D=R 7 R 8 SiO 2/2 ;
D H =HR 9 SiO 2/2 ;
T=R 11 SiO 3/2 ;
T H =HSiO 3/2 ;
and said reaction product has the formula:
M′ g M a M H b-g D c D′ h D H d-h T e T′ i T H f-i where
M′=(CH 2 CHR 1 )R 5 R 6 SiO 1/2 ;
D′=(CH 2 CHR 1 )R 9 SiO 2/2 ; and
T′=(CH 2 CHR 1 )SiO 3/2
with each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 11 independently selected from the group of C1 to C60 monovalent hydrocarbon radicals where the subscripts a, b, c, d, e, f, g, h, and i are zero or positive subject to the limitations that b+d+f−g−h−i>0, g<b, h<d, and i<f.
2. A composition comprising the hydrosilylation reaction product of:
a) the reaction product composition of claim 1 and
b) (M j M Vi k D l D Vi m T n T Vi o ) p Q) q where
the subscripts j, k, l, m, n, o and p are zero or positive subject to the limitation that k+m +o>0, k+m+o<b+d+f−g−h−i, p ranges from 0.4 to 4.0, q is non-zero and positive subject to the limitation that:
(b+d+f−g−h−i)/(((k+m+o)p)q) ranges from 4.59 to 0.25, where
M Vi =R Vi R 5 R 6 SiO 1/2 ;
D Vi =R Vi R 10 SiO 2/2 ;
T Vi =R Vi SiO 3/2 ;
Q=SiO 4/2 ; where
R 10 is independently selected from the group of C1 to C60 monovalent hydrocarbon radicals and each R Vi is independently selected from the group of C2 to C60 monovalent alkenyl hydrocarbon radicals wherein said reaction product is further reacted with:
an amount β of CH 2 ═CHR 1 where R 1 is a monovalent radical selected from the group consisting of halogens, hydrogen, C5 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, and mixtures thereof; and β>b+d+f−g−h−i.
3. The composition of claim 2 wherein R 1 is a monovalent radical selected from the group consisting of C5 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, and mixtures thereof.
4. The composition of claim 2 wherein R 1 is a monovalent radical selected from the group consisting of C5 to C60 monovalent hydrocarbon radicals, C15 to C60 monovalent polyester radicals, C15 to C60 monovalent nitrile radicals, C15 to C60 monovalent alkyl halide radicals, and mixtures thereof.
5. The composition of claim 2 wherein R 1 a is selected from the group consisting of C45 to C60 monovalent hydrocarbon radicals, C30 to C60 monovalent polyester radicals, C30 to C60 monovalent nitrile radicals, C30 to C60 monovalent alkyl halide radicals, and mixtures thereof.
6. The composition of claim 3 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
7. The composition of claim 4 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
8. The composition of claim 5 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
9. The composition of claim 2 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
10. A composition comprising the hydrosilylation reaction product of:
a) M a M H b D c D H d T e T H f ; and
b) an amount α of CH 2 ═CHR 1
where α+1≦b+d+f; 1.5≦b+d+f≦100; 2≦a+b≦12; 0≦c+d≦1000; 0≦e+f≦10, b>0, d>0, and R 1 is a monovalent radical selected from the group consisting of halogens, hydrogen, C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, C1 to C60 monovalent polyether radicals, and mixtures thereof; where
M=R 2 R 3 R 4 SiO 1/2 ;
M H =HR 5 R 6 SiO 1/2 ;
D=R 7 R 8 SiO 2/2 ;
D H =HR 9 SiO 2/2 ;
T=R 11 SiO 3/2 ;
T H =HSiO 3/2 ;
and said reaction product has the formula:
M′ g M a M H b-g D c D′ h D H d-h T e T′ i T H f-i where
M′=(CH 2 CHR 1 )R 5 R 6 SiO 1/2 ;
D′=(CH 2 CHR 1 )R 9 SiO 2/2 ; and
T′=(CH 2 CHR 1 )SiO 3/2
with each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 11 independently selected from the group of C1 to C60 monovalent hydrocarbon radicals where the subscripts a, b, c, d, e, f, g, h, and i are zero or positive subject to the limitations that g>0; b-g>0; h>0; d-h>0; g<b; h<d; and i<f.
11. A composition comprising the hydrosilylation reaction product of:
a) the reaction product composition of claim 10 and
b) (M j M Vi k D l D Vi m T n T Vi o ) p Q) q where
the subscripts j, k, l, m, n, o and p are zero or positive subject to the limitation that k+m +o>0, k+m+o<b+d+f−g−h−i, p ranges from 0.4 to 4.0, q is non-zero and positive subject to the limitation that:
(b+d+f−g−h−i)/(((k+m+o)p)q) ranges from 4.59 to 0.25, where
M Vi =R Vi R 5 R 6 SiO 1/2 ;
D Vi =R Vi R 10 SiO 2/2 ;
T Vi =R Vi SiO 3/2 ;
Q=SiO 4/2 ; where
R 10 is independently selected from the group of C1 to C60 monovalent hydrocarbon radicals and each R Vi is independently selected from the group of C2 to C60 monovalent alkenyl hydrocarbon radicals wherein said reaction product is further reacted with:
an amount β of CH 2 ═CHR 1 where R′ is a monovalent radical selected from the group consisting of halogens, hydrogen, C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, C1 to C60 monovalent polyether radicals, and mixtures thereof; and β>b+d+f−g−h−i.
12. The composition of claim 11 wherein R 1 is a monovalent radical selected from the group consisting of C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, C1 to C60 monovalent polyether radicals, and mixtures thereof.
13. The composition of claim 11 wherein R 1 is a monovalent radical selected from the group consisting of C15 to C60 monovalent hydrocarbon radicals, C15 to C60 monovalent polyester radicals, C15 to C60 monovalent nitrile radicals, C15 to C60 monovalent alkyl halide radicals, C15 to C60 monovalent radical monovalent polyether radicals, and mixtures thereof.
14. The composition of claim 11 wherein R 1 is a monovalent radical selected from the group consisting of C30 to C60 monovalent hydrocarbon radicals, C30 to C60 monovalent polyester radicals, C30 to C60 monovalent nitrile radicals, C30 to C60 monovalent alkyl halide radicals, C30 to C60 monovalent polyether radicals, and mixtures thereof.
15. The composition of claim 12 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
16. The composition of claim 13 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
17. The composition of claim 14 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
18. The composition of claim 11 wherein R 1 is phenyl.
19. The composition of claim 18 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
20. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 10 .
21. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 11 .
22. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 12 .
23. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 13 .
24. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 14 .
25. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 15 .
26. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 16 .
27. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 17 .
28. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 18 .
29. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto the composition of claim 19 .
30. A composition to reduce misting during the coating of flexible supports comprising the hydrosilylation reaction product of:
I) a composition comprising the hydrosilylation reaction product of:
a) M a M H b D c D H d T e T H f ; and
b) an amount α of CH 2 ═CHR 1
where α+1≦b+d+f and G≦b, b≦d, i≦f 1.5≦b+d+f≦100; 2≦a+b≦12; 0≦c+d≦1000; 0≦e+f≦10 and Ris a monovalent radical selected from the group consisting of C30 to C60 monovalent hydrocarbon radicals, C30 to C60 monovalent polyester radicals, C30 to C60 monovalent nitrile radicals, C30 to C60 monovalent alkyl halide radicals, C30 to C60 monovalent polyether radicals and mixtures thereof; where
M=R 2 R 3 R 4 SiO 1/2 ;
M H =HR 5 R 6 SiO 1/2 ;
D=R 7 R 8 SiO 2/2 ;
D H =HR 9 SiO 2/2 ;
T=R 11 SiO 3/2 ;
T H =HSiO 3/2 ;
and said reaction product has the formula:
M′ g M a M H b-g D c D′ h D H d-h T e T′ i T H f-i where
M′=(CH 2 CHR 1 )R 5 R 6 SiO 1/2 ;
D′=(CH 2 CHR 1 )R 9 SiO 2/2 ; and
T′=(CH 2 CHR 1 )SiO 3/2
with each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 11 independently selected from the group of C1 to C60 monovalent hydrocarbon radicals where the subscripts a, b, c, d, e, f, g, h, and i are zero or positive subject to the limitations that b+d+f−g−h−i>0; and,
(II) (M j M Vi k D l D Vi m T n T Vi o ) p Q) q where
the subscripts j, k, l, m, n, o and p are zero or positive subject to the limitation that k+m+o>0, k+m+o<b+d+f−g−h−i , p ranges from 0.4 to 4.0, q is non-zero and positive subject to the limitation that:
(b+d+f−g−h−i)/(((k+m+o)p)q) ranges from 4.59 to 0.25, where
M Vi =R Vi R 5 R 6 SiO 1/2 ;
D Vi =R Vi R 10 SiO 2/2 ;
T Vi =R Vi SiO 3/2 ;
Q=SiO 4/2 ; where
R 10 is independently selected from the group of C1 to C60 monovalent hydrocarbon radicals and each R Vi is independently selected from the group of C2 to C60 monovalent alkenyl hydrocarbon radicals; and, wherein said reaction product of (I) and (II) is further reacted with:
an amount β of CH 2 ═CHR 1 where wherein R 1 is a monovalent radical selected from the group consisting of C30 to C60 monovalent hydrocarbon radicals, C30 to C60 monovalent polyester radicals, C30 to C60 monovalent nitrile radicals, C30 to C60 monovalent alkyl halide radicals, C30 to C60 monovalent polyether radicals and mixtures thereof; and β>b+d+f−g−h−i.
31. The composition of claim 30 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
32. A composition to reduce misting during the coating of flexible supports comprising the hydrosilylation reaction product of:
I) a composition comprising the hydrosilylation reaction product of:
a) M a M H b D c D H d T e T H f ; and
b) an amount α of CH 2 ═CHR 1
where α+1≦b+d+f and g≦b, h≦d, i≦f with 1.5≦b+d+f≦100; 2≦a+b≦12; 0≦c+d≦1000; 0≦e+f≦10 and R 1 is styryl; where
M=R 2 R 3 R 4 SiO 1/2 ;
M H =HR 5 R 6 SiO 1/2 ;
D=R 7 R 8 SiO 2/2 ;
D H =HR 9 SiO 2/2 ;
T=R 11 SiO 3/2 ;
T H =HSiO 3/2 ;
and said reaction product of (a) and (b) has the formula:
M′ g M a M H b-g D c D′ h D H d-h T e T′ i T H f-i where
M′=(CH 2 CHR 1 )R 5 R 6 SiO 1/2 ;
D=(CH 2 CHR 1 )R 9 SiO 2/2 ; and
T′=(CH 2 CHR 1 )SiO 3/2
with each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 11 independently selected from the group of C1 to C60 monovalent hydrocarbon radicals where the subscripts a, b, c , d , e, f g, h, and i are zero or positive subject to the limitations that b+d+f−g−h−i>0; and,
(II) (M j M Vi k D l D Vi m T n T Vi o ) p Q) q where
the subscripts j, k, l, m, n, o and p are zero or positive subject to the limitation that k+m+o>0, k+m+o<b+d+f−g−h−i , p ranges from 0.4 to 4.0, q is non-zero and positive subject to the limitation that:
(b+d+f−g−h−i)/(((k+m+o)p)q) ranges from 4.59 to 0.25, where
M Vi =R Vi R 5 R 6 SiO 1/2 ;
D Vi =R Vi R 10 SiO 2/2 ;
T Vi =R Vi SiO 3/2 ;
Q=SiO 4/2 ; where
R 10 is independently selected from the group of C1 to C60 monovalent hydrocarbon radicals and each R Vi is independently selected from the group of C2 to C60 monovalent alkenyl hydrocarbon radicals; and, wherein said reaction product of (I) and (II) is further reacted with:
an amount β of CH 2 ═CHR 1 where R′ is phenyl, and β>b+d+f−g−h−i.
33. The composition of claim 32 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
34. A process to reduce misting in the coating of a flexible substrate said process comprising preparing a coating composition for coating said substrate and adding thereto a composition comprising the hydrosilylation reaction product of:
a) M a M H b D c D H d T e T H f ; and
b) an amount α of CH 2 ═CHR 1
where α+1≦b+d+f and g≦b, h≦d, i≦f with 1.5≦b+d+f≦100; 2≦a +b≦12; 0≦c+d≦1000; 0≦e+f≦10 and R 1 is a monovalent radical selected from the group consisting of halogens, hydrogen, C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals and C1 to C60 monovalent polyether radicals and mixtures thereof; where
M=R 2 R 3 R 4 SiO 1/2 ;
M H =HR 5 R 6 SiO 1/2 ;
D=R 7 R 8 SiO 2/2 ;
D H =HR 9 SiO 2/2 ;
T=R 11 SiO 3/2 ;
T H =HSiO 3/2 ;
and said reaction product has the formula:
M′ g M a M H b-g D c D′ h D H d-h T e T′ i T H f-i where
M′=(CH 2 CHR 1 )R 5 R 6 SiO 1/2 ;
D′=(CH 2 CHR 1 )R 9 SiO 2/2 ; and
T′=(CH 2 CHR 1 )SiO 3/2
with each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , and R 11 independently selected from the group of C1 to C60 monovalent hydrocarbon radicals where the subscripts a, b, c, d, e, f, g, h, and i are zero or positive subject to the limitations that b+d+f−g−h−i>0.
35. A process to reduce misting in the coating of a flexible substrate composition said process comprising preparing a coating composition for coating said substrate and adding thereto the hydrosilylation reaction product of:
a) the reaction product composition of the process of claim 34 and
(M j M Vi k D l D Vi m T n T Vi o ) p Q) q where
the subscripts j, k, l, m, n, o and p are zero or positive subject to the limitation that k+m+o>0, k+m+o<b+d+f−g−h−i, p ranges from 0.4 to 4.0, q is non-zero and positive subject to the limitation that:
(b+d+f−g−h−i)/(((k+m+o)p)q) ranges from 4.59 to 0.25, where
M Vi =R Vi R 5 R 6 SiO 1/2 ;
D Vi =R Vi R 10 SiO 2/2 ;
T Vi =R Vi SiO 3/2 ;
Q=SiO 4/2 ; where
R 10 is independently selected from the group of C1 to C60 monovalent hydrocarbon radicals and each R Vi is independently selected from the group of C2 to C60 monovalent alkenyl hydrocarbon radicals wherein said reaction product is further reacted with:
an amount β of CH 2 ═CHR 1 where wherein R′ is a monovalent radical selected from consisting of halogens, hydrogen, C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, C1 to C60 monovalent polyether radicals, and mixtures thereof; and β>b+d+f−g−h−i.
36. The process of claim 35 wherein R 1 is a monovalent radical selected from the group consisting of C1 to C60 monovalent hydrocarbon radicals, C1 to C60 monovalent polyester radicals, C1 to C60 monovalent nitrile radicals, C1 to C60 monovalent alkyl halide radicals, C1 to C60 monovalent polyether radicals, and mixtures thereof.
37. The process of claim 35 wherein R 1 is a monovalent radical selected from the group consisting of C15 to C60 monovalent hydrocarbon radicals, C15 to C60 monovalent polyester radicals, C15 to C60 monovalent nitrile radicals, C15 to C60 monovalent alkyl halide radicals, C15 to C60 monovalent polyether radicals, and mixtures thereof.
38. The process of claim 35 wherein R 1 is a monovalent radical selected from the group consisting of C30 to C60 monovalent hydrocarbon radicals, C30 to C60 monovalent polyester radicals, C30 to C60 monovalent nitrile radicals, C30 to C60 monovalent alkyl halide radicals, C30 to C60 monovalent polyether radicals, and mixtures thereof.
39. The process of claim 36 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
40. The process of claim 37 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
41. The process of claim 38 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.
42. The process of claim 35 wherein R 1 is styryl.
43. The process of claim 42 where each R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 are methyl.