Silicon powder for preparing alkyl- or aryl-halogenosilanes
View Patent ↗The invention concerns a silicon powder for making alkyl- or aryl-halogenosilanes, with particle-size distribution less than 350 μm, and containing less than 3% and preferably less than 2% of particles having a size less than 5 μm. Said powder enables to improve efficiency of synthesis reaction.
1. Silicon or silicon alloy powder suitable for preparing alkyl-or aryl-halogenosilanes of a particle size of less than 350 μm, wherein the amount of particles therein having a size less than 5 μm is from 0.5 to 3% by weight, and at least 97% of particles therein have a size from 50–350 μm.
2. Silicon powder according to claim 1 , wherein the amount of particles having a size less than 5 μm is less than 2% by weight.
3. A method for preparing the powder according to claim 1 , comprising grinding powder to a particle size less than 350 μm, washing with water, decantation and drying.
4. A method according to claim 3 , wherein powder ground to less than 350 μm is screened to 50 μm to obtain a particle size distribution of 50–350 μm.
5. A method for preparing the powder according to claim 1 , comprising grinding powder to a particle size of less than 350 μm, screening to obtain a particle size distribution of 50–350 μm and dispersion of said powder in a gas stream in the laminar flow state.
6. A method according to claim 5 , wherein the gas comprises oxygen-depleted air.
7. A method for preparing alkyl- or aryl-halogenosilanes comprising reacting a halogenated hydrocarbon with a silicon or silicon alloy powder of claim 1 , at a temperature from 250°–350° C.
8. A method according to claim 7 , wherein the fraction of particles having a size less than 5 μm is less than 2% by weight.
9. A method according to claim 7 , wherein the silicon or silicon alloy powder is obtained by grinding powder to a particle size less than 350 μm, washing with water, decontation and drying.
10. A method according to claim 9 , wherein the powder ground to less than 350 μm is screened to 50 μm to obtain a particle size distribution of 50–350 μm.
11. A method according to claim 7 , wherein the silicon or silicon alloy powder is obtained by grinding of powder to a particle size of less than 350 μm, screening to obtain a particle size distribution of 50–350 μm and dispersion of said powder in a gas stream in the laminar flow state.
12. A method according to claim 11 , wherein the gas comprises oxygen-depleted air.
13. A method for preparing the powder according to claim 2 , comprising grinding of powder to a particle size less than 350 μm, washing wit water, decantation and drying.
14. A method for preparing powder according to claim 2 , comprising grinding powder to a particle size of less than 350 μm, screening to obtain a particle size distribution of 50–350 m and dispersion of said powder in a gas stream in the laminar flow state.
15. A method according to claim 8 , wherein the silicon or silicon alloy powder is obtained by grinding powder to a particle size less than 350 μm, washing with water, decantation and drying.
16. A method according to claim 8 , wherein the silicon or silicon alloy powder is obtained by grinding powder to a particle size of less than 350 μm, screening to obtain a particle size distribution of 50–350 μm and dispersion of said powder in a gas stream in the laminar flow state.
17. Powder according to claim 1 , wherein at least 98% thereof has particle size from 50–350 μm.