Sulfonium salt compound
View Patent ↗A compound shown by the general formula [1] (wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group, Y n− is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R 1 , R 2 and R 3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.
1. A composition comprising
a compound shown by the formula [1]
wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group; Y n− is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms; n is 1 or 2; R 1 , R 2 and R 3 being a phenyl group having substituents at o-position and/or m-position is excluded; and
a diazodisulfone compound.
2. A cationic photopolymerization initiator, which comprises the the composition of claim 1 .
3. An acid generator, which comprises the composition according to claim 1 .
4. An acid generator for a chemically amplified resist, which comprises the composition according to claim 1 .
5. A composition according to claim 1 , wherein the diazodisulfone compound is shown by the formula [10]
wherein, R 10 and R 11 are each independently an alkyl group.
6. A resist composition, which comprises
a polymer having a pending protecting group to become soluble in an alkaline developing solution by an action of an acid and
the composition according to claim 5 .
7. A resist composition, which comprises
a polymer soluble in an alkaline developing solution, a dissolving-inhibiting agent having a pending protecting group to become soluble in an alkaline developing solution by an action of an acid, and
the composition according to claim 5 .
8. A resist composition, which comprises
a polymer soluble in an alkaline developing solution, a cross-linking agent to cross-link the polymer by a heat treatment in the presence of an acid to make insoluble in an alkaline developing solution, and
the composition according to claim 5 .