IP Library Granted Patent US 7,053,198
Granted Patent B2
US 7,053,198 · App. 10/313,652 · Granted May 30, 2006

Functionated photoacid generator and functionated polymer system for biological microarray synthesis

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Quick Facts
Patent No.
US 7,053,198
App. No.
10/313,652
Granted
May 30, 2006
Kind
B2
Abstract

In some embodiment of the invention, methods are provided for the synthesis of polymer arrays. In one embodiment, a reactive polymer and a photo acid generator is used for the photodirected polymer array synthesis.

Claims (41)

1. A method for making polymer arrays comprising:

a) Coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms;

 wherein x and y are repeating units of the structure;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas, wherein the monomer is a nucleotide.

2. A method for making polymer arrays comprising:

a) Coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms;

 wherein x and y are repeating units of the structure;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas; wherein the monomer is an amino acid.

3. A method for making polymer arrays comprising:

a) Coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms;

 wherein x and y are repeating units of the structure, wherein the hydroxyl group is present at either the ortho, meta or para positions throughout the polymer and wherein the R group is substituted by one or more halogen;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas.

4. The method of claim 3 wherein the phenolic units of the polymer is substituted by one or more halogen.

5. A method of making polymer arrays comprising:

a) coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms, and wherein R is substituted by one or more halogens;

 wherein R′ is substituted or unsubstituted alkyl oxycarbonyl located at either the ortho, meta, or para positions; and

 wherein x and y are repeating units of the structure;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas.

6. A method of making polymer arrays comprising:

a) coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms;

 wherein R′ is substituted or unsubstituted alkyl oxycarbonyl located at either the ortho, meta, or para positions and wherein R′ is substituted by one of more halogens; and

 wherein x and y are repeating units of the structure;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas.

7. A method of making polymer arrays comprising:

a) coating a substrate with a reactive polymer matrix and a photo carboxylic acid generator; wherein the reactive polymer has the structure of:

 wherein R is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms;

wherein R′ is substituted or unsubstituted alkyl oxycarbonyl located at either the ortho, meta, or para positions;

 wherein x and y are repeating units of the structure; and

 wherein the phenolic unit of the polymer is substituted by one or more halogen;

b) exposing the substrate with patterned radiation to remove acid labile protecting group in reaction areas;

c) coupling a monomer into the reaction areas.

Assignments (4)
NOTICE OF RELEASE Recorded Apr 5, 2016
From: BANK OF AMERICA, N.A.
To: AFFYMETRIX, INC.
Reel/Frame 038361/0891 →
RELEASE OF SECURITY INTEREST Recorded Nov 13, 2015
From: GENERAL ELECTRIC CAPITAL CORPORATION, AS AGENT
To: AFFYMETRIX, INC.
Reel/Frame 037109/0132 →
SECURITY INTEREST Recorded Oct 28, 2015
From: AFFYMETRIX, INC.
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 036988/0166 →
SECURITY AGREEMENT Recorded Jun 27, 2012
From: AFFYMETRIX, INC.
To: GENERAL ELECTRIC CAPITAL CORPORATION, AS AGENT
Reel/Frame 028465/0541 →