Systems and methods for wavefront measurement
View Patent ↗A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected from, transmitted through or internally reflected within objects sought to be measured, e.g., optical systems, the human eye, etc. includes placing a reticle in the path of a return beam from the object, and placing a detector at a diffraction pattern self-imaging plane relative to the reticle. The diffraction pattern is analyzed and results in a model of the wavefront phase characteristics. A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object or within the wavefront source being measured.
1. A system for determining the shape of an electromagnetic wavefront, comprising:
at least one reticle positioned in a path of the wavefront to be analyzed;
at least one detector positioned to detect the wavefront passing through the reticle, the detector being substantially located at a diffraction pattern self-imaging plane relative to the reticle; and
at least one processor receiving an output signal from the light detector and calculating the shape of the wavefront based thereon, wherein the processor executes logic to determine directional derivatives of the electromagnetic wavefront and transform a diffraction pattern of the wavefront at the detector from a spatial image domain into a spatial frequency domain, prior to the act of determining directional derivatives.
2. The system of claim 1 , wherein selected portions in the spatial frequency domain are used to determine said directional derivatives.
3. A system for determining the shape of an electromagnetic wavefront, comprising:
at least one reticle positioned in a path of the wavefront to be analyzed;
at least one detector positioned to detect the wavefront passing through the reticle, the detector being substantially located at a diffraction pattern self-imaging plane relative to the reticle; and
at least one processor receiving an output signal from the light detector and calculating the shape of the wavefront based thereon, wherein the processor executes logic to determine directional derivatives of the electromagnetic wavefront and determine coefficients of polynomials based on at least one gradient of a phase-front of the wavefront, the coefficients being representative of the shape of the wavefront.
4. The system of claim 3 , wherein the coefficients are determined by fitting derivative functions of a set of known polynomials to the derivatives obtained during the determining act.
5. A system for determining the shape of an electromagnetic wavefront, comprising:
at least one reticle positioned in a path of the wavefront to be analyzed;
at least one detector positioned to detect the wavefront passing through the reticle, the detector being substantially located at a diffraction pattern self-imaging plane relative to the reticle; and
at least one processor receiving an output signal from the light detector and calculating the shape of the wavefront based thereon, wherein the processor executes logic to determine directional derivatives of the electromagnetic wavefront and further wherein the directional derivatives are determined in at least two directions.
6. A system for determining the shape of an electromagnetic wavefront, comprising:
at least one reticle positioned in a path of the wavefront to be analyzed;
at least one detector positioned to detect the wavefront passing through the reticle, the detector being substantially located at a diffraction pattern self-imaging plane relative to the reticle; and
at least one processor receiving an output signal from the light detector and calculating the shape of the wavefront based thereon, wherein the processor executes logic to determine directional derivatives of the electromagnetic wavefront and implement a computational matte screen for filtering out noise.
7. An apparatus for characterizing an object with a wavefront from the object, comprising:
at least one reticle positioned in a path of the wavefront;
at least one light detector positioned relative to the reticle to receive a self-image diffraction pattern of the reticle produced by the wavefront;
at least one processor receiving signals from the light detector representative of the self-image diffraction pattern and deriving derivatives associated therewith, the processor using the derivatives to characterize said object; and
wherein the object is an eye.
8. An apparatus for characterizing an object with a wavefront from the object, comprising:
at least one reticle positioned in a path of the wavefront;
at least one light detector positioned relative to the reticle to receive a self-image diffraction pattern of the reticle produced by the wavefront;
at least one processor receiving signals from the light detector representative of the self-image diffraction pattern and deriving derivatives associated therewith, the processor using the derivatives to characterize said object; and
wherein the location of the reticle is related to the wavelength of the wavefront and spatial frequency of the reticle.
9. An apparatus for characterizing an object with a wavefront from the object, comprising:
at least one reticle positioned in a path of the wavefront;
at least one light detector positioned relative to the reticle to receive a self-image diffraction pattern of the reticle produced by the wavefront; and
at least one processor receiving signals from the light detector representative of the self-image diffraction pattern and deriving derivatives associated therewith, the processor using the derivatives to characterize said object, wherein the processor produces frequency transformation of the wavefront to produce a distribution in frequency space and derives derivatives of phases of the wavefront from the distribution in frequency space.
10. A method for determining aberrations in a reflective or internally reflective object system, comprising:
passing a light beam from the object system through a reticle, said light beam producing a near field diffraction pattern at said Talbot plane;
imaging said near field diffraction pattern at a Talbot plane;
using said near field diffraction pattern to output a measure of aberrations in the light beam; and
transforming a wavefront associated with the light beam from a spatial image domain into a spatial frequency domain.
11. The method of claim 10 , wherein only selected portions in said spatial frequency domain are used to determine directional derivatives.
12. A computer readable medium for storing computer executable instructions that when executed perform a process for determining aberrations in at least one object, the process comprising:
receiving at least one representation of a wavefront propagating from the object, wherein at least one detector is substantially located at a diffraction pattern self-imaging plane relative to the at least one object;
transforming the at least one representation of a wavefront from a spatial image domain into a spatial frequency domain;
determining directional derivatives of the representation;
fitting the directional derivatives to known polynomials or derivatives thereof to obtain coefficients of polynomials; and
outputting at least one signal based at least in part on the coefficients, the signal representing aberrations in the object.