IP Library Granted Patent US 7,547,431
Granted Patent B2
US 7,547,431 · App. 10/315,272 · Granted Jun 16, 2009

High purity nanoscale metal oxide powders and methods to produce such powders

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Quick Facts
Patent No.
US 7,547,431
App. No.
10/315,272
Granted
Jun 16, 2009
Kind
B2
Abstract

A method of producing high purity nanoscale powders in which the purity of powders produced by the method exceeds 99.99%. Fine powders produced are of size preferably less than 1 micron, and more preferably less than 100 nanometers. Methods for producing such powders in high volume, low-cost, and reproducible quality are also outlined. The fine powders are envisioned to be useful in various applications such as biomedical, sensor, electronic, electrical, photonic, thermal, piezo, magnetic, catalytic and electrochemical products.

Claims (37)

1. A method for producing high purity metal oxide powder comprising:

providing a feed comprising a precursor with a purity greater than 99.9% on metal basis;

suspending the feed in a gas in a mixing apparatus to create a gas-stream suspension, whereafter the gas-stream suspension is fed to a thermal reactor;

a first step wherein the feed suspended in a gas is processed at a temperature greater than 2000° C. in the thermal reactor thereby producing a stream comprising vapor;

a second step wherein the stream comprising vapor is provided thermokinetic conditions such that it forms a stream comprising high purity metal oxide powder with a purity greater than 99.9% on metal basis; and

a third step wherein the stream comprising high purity metal oxide powder is quenched.

2. The method of claim 1 , where the temperature is greater than 3000° C.

3. The method of claim 1 , wherein the high purity metal oxide powder comprises a submicron powder.

4. The method of claim 1 , wherein the high purity metal oxide powder comprises a nanoscale powder.

5. The method of claim 1 , wherein the high purity metal oxide powder comprises a multimetal, composition.

6. The method of claim 1 , wherein the high purity metal oxide powder comprises cerium.

7. The method of claim 1 , wherein the high purity metal oxide powder comprises a metal selected from the group consisting of: aluminum, silicon, yttrium, barium, calcium, strontium, titanium, and zirconium.

8. The method of claim 1 , wherein the high purity metal oxide powder comprises a metal selected from the group consisting of: magnesium, iron and copper.

9. The method of claim 1 , wherein the high purity metal oxide powder has a purity greater than 99.999% on metal basis.

10. The method of claim 1 , wherein the gas comprises oxygen.

11. The method of claim 1 , wherein the gas comprises an inert gas.

12. The method of claim 1 , further comprising the act of filtering the high purity metal oxide powder from the stream.

13. The method of claim 1 , wherein the first step comprises a plasma process.

14. The method of claim 13 , wherein the plasma process comprises DC plasma.

15. The method of claim 1 , wherein the step of providing thermokinetic conditions comprises cooling the stream comprising vapor.

16. The method of claim 1 , wherein the precursor comprises fluid.

17. The method of claim 1 , wherein the high purity metal oxide powder is stoichiometric.

18. The method of claim 1 , wherein the high purity metal oxide powder is non-stoichiometric.

19. The method of claim 1 , wherein the high purity metal oxide powder comprises a functionalized surface.

20. The method of claim 1 , wherein the gas comprises at least one reactive fluid selected from the group consisting of: water vapor, air and oxygen.

21. The method of claim 1 , wherein the precursor comprises a composition of matter wherein at least one substance is selected from the group consisting of: metal acetate, metal carboxylate, metal ethanoate, metal alkoxide, metal octoate, metal chelate, metal halide, metal azide, metal nitrate, metal sulfate, metal hydroxide, metal salt soluble in water, metal salt soluble in an organic solvent and an emulsion comprising a metal.

22. A method for producing high purity metal oxide powder comprising:

providing a plasma;

providing a feed comprising a precursor with a purity greater than 99.9% on metal basis;

suspending the feed in a gas comprising oxygen;

a step wherein the feed suspended in a gas comprising oxygen is processed in the plasma thereby producing a stream comprising vapor;

step wherein the stream comprising vapor is formed into a stream comprising high purity metal oxide nanopowder with a purity greater than 99.9% on metal basis; and

an additional step wherein the stream comprising high purity metal oxide powder is quenched.

23. The method of claim 22 , wherein the plasma comprises a DC plasma.

24. The method of claim 22 , wherein the high purity metal oxide powder comprises stoichiometric powder.

25. The method of claim 22 , wherein the high purity metal oxide powder comprises non-stoichiometric powder.

26. The method of claim 22 , wherein the feed suspended in a gas comprises a powder suspension.

Assignments (4)
CONFIRMATORY LICENSE Recorded Mar 21, 2012
From: SLOAN-KETTERING INSTITUTE FOR CANCER RES
To: NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT
Reel/Frame 027902/0737 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2008
From: NANOPRODUCTS CORPORATION
To: PPG INDUSTRIES OHIO, INC.
Reel/Frame 020540/0506 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 14, 2007
From: YADAV, TAPESH; DIRSTINE, ROGER; AVNIEL, YUVAL; PFAFFENBACH, KARL
To: NANOPRODUCTS CORPORATION
Reel/Frame 019429/0684 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 10, 2002
From: YADAV, TAPESH; AVNIEL, YUVAL; DIRSTINE, ROGER; PFAFFENBACH, KARL
To: NANOPRODUCTS CORPORATION
Reel/Frame 013565/0564 →