Method of forming resist pattern, and exposure device

1. A device for exposure of an object surface having a predetermined shrinkage rate during bake processing of the object following exposure, the device comprising:

(a) an optical system having a light source which when operated irradiates light of a substantially uniform intensity towards a target location, which location is placement of the object surface comprising a plurality of exposure unit regions thereat for exposure,

(b) a filter provided between the target location and the light source, the filter being divided into a plurality of unit areas each of which being smaller than the exposure unit regions and having a transmission rate per unit area adjustable to at least three different levels, the filter being passed light having an exposure amount corresponding to a predetermined shrinkage rate in the object surface based on bake processed following exposure of light irradiated from the light source therethrough.

2. The device of claim 1 , wherein the transmission rate of the filter is corrected for each predetermined region of the object surface for reducing a distribution of errors in the shrinkage rate, which distribution corresponds to a temperature distribution arising in the object during the bake process.

3. The device of claim 1 , wherein the transmission rate of the filter is corrected for each predetermined region of the object to be processed for reducing a distribution of errors in the shrinkage rate for forming a final pattern on the object surface.

4. The device of claim 1 , wherein a total area of the unit areas is larger than a total area of the exposure unit regions.