Method of fabricating liquid crystal display device
A method of fabricating a liquid crystal display includes aligning a mask on a substrate, applying surface treatment to the substrate using light that has passed through the mask, forming a spacer pattern at the surface treated area, and forming a spacer by hardening the spacer pattern. Surface treatment is applied to the area where a spacer is to be formed by an ion beam, ultraviolet radiation or a laser beam. By forming the spacer at the surface treated area using an ink jet, it is possible to control the shape and height of the spacer. Also, since the ink jet is located at the surface treated area, it become easier to align the ink jet to accurately form the spacer at the desired place.
1. A method of fabricating a liquid crystal display, comprising:
forming a black matrix on a substrate;
forming a color filter on the substrate where the black matrix is formed;
forming a common electrode on the substrate where the color filter is formed;
forming an alignment film on the substrate where the common electrode is formed;
aligning a mask having a transmissive part on the substrate where the alignment film is formed;
directly applying light to a portion of the alignment film corresponding to the black matrix through the transmissive part of the mask to form a surface treated area which has a surface property different from the other portion of the alignment film;
depositing a spacer material at the surface treated area, wherein the spacer material is deposited at the surface treated area using an ink jet head nozzle, wherein a property of the space material is the same as the surface property of the surface treated area;
forming a spacer by hardening the spacer material; and
subsequently introducing a liquid crystal material over the substrate.
2. The method according to claim 1 , further comprising aligning the mask such that the transmitting part of the mask is located over the portion of the alignment film corresponding to the black matrix and a shielding part of the mask is located over an area other than the portion of alignment film corresponding to the black matrix.
3. The method according to claim 2 , wherein a width of the transmitting part of the mask is approximately 1-10 μm.
4. The method according to claim 3 , wherein the width of the transmitting part of the mask is approximately 5 μm.
5. The method according to claim 1 , wherein the surface property of the surface treated area has a hydrophilic or hydrophobic property.