Semiconductor element comprising a sequence of layers for converting acoustic or thermal signal and electrical voltage changes into each other and method for producing the same
View Patent ↗A semiconductor component is provided having a layer sequence for conversion of acoustic to thermal signals and electrical voltage changes to one another, as well as a process for its production. The layer sequence has a lower electrode, an upper electrode and a layer which is arranged between them and is piezoelectrical or pyroelectrical. An auxiliary layer is arranged between the lower electrode and the layer and is used for homogeneously oriented growth of the layer during the production process. The auxiliary layer preferably consists essentially of amorphous silicon, amorphous silicon oxide or amorphous silicon nitride.
1. A semiconductor component, having a layer sequence for conversion of acoustic or thermal signals and electrical voltage changes to one another, the layer sequence comprising:
a lower electrode;
an upper electrode;
a layer which is arranged between the lower electrode and the upper electrode and is piezoelectrical or pyroelectrical; and
an auxiliary layer arranged between the lower electrode and the layer, the auxiliary layer consisting essentially of amorphous silicon or amorphous silicon oxide, the auxiliary layer being configured to promote homogeneously oriented growth of the layer during the production process.
2. The semiconductor component as claimed in claim 1 , wherein the layer consists essentially of AlN.
3. The semiconductor component as claimed in claim 1 , wherein the lower electrode and the upper electrode consist essentially of a material selected from the group consisting of tungsten, molybdenum, platinum, an aluminum alloy and a combination of these metals.
4. The semiconductor component as claimed in claim 1 , wherein the auxiliary layer is between 5 nm and 50 nm thick.
5. The semiconductor component as claimed in claim 1 , wherein the semiconductor component is in the form of a bulk acoustic wave resonator or of a filter, the semiconductor component further comprising a mount on which the layer sequence is arranged, which is configured to reflect acoustic oscillations produced by the layer sequence.
6. The semiconductor component as claimed in claim 1 , wherein the lower electrode is polished on a surface which is adjacent to the auxiliary layer.
7. A method for producing a semiconductor component having a layer sequence for conversion of acoustic or thermal signals and electrical voltage changes for one another, the method comprising:
providing a lower electrode;
providing a layer above the lower electrode that is piezoelectrical or pyroelectrical;
providing an auxiliary layer, which consists essentially of amorphous silicon or amorphous silicon oxide, such that this auxiliary layer promotes homogeneously oriented growth of the piezoelectrical or pyroelectrical layer; and
providing an upper electrode above the piezoelectrical or pyroelectrical layer.
8. The method as claimed in claim 7 , wherein the layer is consists essentially of AlN.
9. The method as claimed in claim 7 , wherein the lower electrode and the upper electrode consist essentially of a material selected from the group consisting of tungsten, molybdenum, platinum, an aluminum alloy and a combination of these metals.
10. The method as claimed in claim 7 , wherein the auxiliary layer is provided between n 5 nm and 50 nm thick.
11. The method as claimed in claim 7 , wherein providing the lower electrode comprises:
depositing tungsten using a CVD process; and then
smoothing with at least one of a chemical and mechanical polishing.
12. The method as claimed in claim 7 , further comprising:
providing a mount on which the layer sequence is provided, the mount being designed such that it reflects acoustic oscillations produced by the layer sequence, wherein the semiconductor component is produced as a bulk acoustic wave resonator or as a filter.