IP Library Granted Patent US 6,866,896
Granted Patent B2
US 6,866,896 · App. 10/359,402 · Granted Mar 15, 2005

Method for treating metallic surfaces and products formed thereby

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Quick Facts
Patent No.
US 6,866,896
App. No.
10/359,402
Granted
Mar 15, 2005
Kind
B2
Abstract

An electroless or electrolytic process for treating metallic surfaces is disclosed. The disclosed process exposes the metallic surface to a first medium comprising at least one silicate, and then to a second medium comprising colloidal silica (additional processing steps can be employed before, between and after exposure to the first and second mediums). The first and second mediums can be electrolytic or electroless.

Claims (43)

1. A method for treating an electrically conductive surface comprising:

contacting at least a portion of the surface with a first medium having a basic pH and substantially free of chromates and comprising sodium silicate comprising at least about 13 w/w % Na2O wherein the first medium has a temperature of about 25 to 95° C., and;

contacting at least a portion of the surface with a second medium comprising at least one siliceous material wherein the siliceous material comprises colloidal silica.

2. The method of claim 1 wherein the first medium comprises at least one polar carrier, sodium silicate soluble within said carrier, colloidal silica, and wherein the first medium has a basic pH and is substantially free of chromates.

3. A method for treating a metallic or an electrically conductive surface comprising:

exposing at least a portion of the surface to an electrolytic environment comprising a first medium comprising a combination comprising at least one polar carrier and at least one oligomeric silicate that is soluble within said carrier wherein said medium has a basic pH and said surface comprises a cathode, and;

exposing at least a portion of the surface to a second medium comprising colloidal silica wherein said second medium comprises an electroless environment.

4. The method of claim 1 wherein the sodium silicate has a SiO2 wt./Na2O wt ratio of about 2.

5. The method of claim 1 wherein the surface comprises at least one member selected from the group consisting of copper, nickel, tin, iron, zinc, aluminum, magnesium, stainless steel and steel and alloys thereof.

6. The method of claim 3 further comprising applying at least one coating upon the treated surface.

7. The method of claim 1 wherein at least one of the first and second mediums further comprise at least one dopant selected from the group consisting of zinc, molybdenum and nickel.

8. The method of claim 1 wherein prior to contacting with said second medium the metal surface is dried at a temperature of at least about 120 C.

9. The method of claim 1 further comprising applying at least one coating upon the treated surface.

10. The method of claim 2 wherein the first medium comprises greater than 1 wt. % of said at least one silicate and further comprises at least one dopant selected from the group consisting of nickel, molybdenum and zinc.

11. The method of claim 1 wherein said surface comprises zinc.

12. The method of claim 3 wherein at least one of said first and second mediums further comprise at least one water soluble compound selected from the group consisting of from the group of titanium chloride, tin chloride, zirconium acetate, zirconium oxychloride, calcium fluoride, tin fluoride, titanium fluoride, zirconium fluoride; ammonium fluorosilicate, aluminum nitrate; magnesium sulphate, sodium sulphate, zinc sulphate, copper sulphate; lithium acetate, lithium bicarbonate, lithium citrate, lithium metaborate, lithium vanadate and lithium tungstate.

13. The method of claim 1 wherein said first medium comprises an electrolytic environment wherein the surface comprises the cathode.

14. The method of claim 1 further comprising rinsing the metal surface, prior to contacting with said second medium, with a solution comprising water and at least one dopant.

15. The method of claim 14 wherein the dopant comprises at least one member selected from the group consisting of molybdenum, titanium, zircon, vanadium, phosphorus, aluminum, iron, boron, bismuth, gallium, tellurium, germanium, antimony, niobium, magnesium, manganese, zinc, aluminum, nickel and their oxides and salts.

16. The method of claim 3 further comprising, prior to said exposing to the first medium, contacting said surface with at least one member selected from the group consisting of acid and basic cleaners.

17. The method of claim 1 wherein said surface comprises a cathode in the electrolytic environment of the first medium and said second medium comprises an electroless environment.

18. The method of claim 9 wherein said coating comprises at least one member chosen from the group of latex, silanes, epoxies, silicone, amines, alkyds, urethanes, polyester and acrylics.

19. A method for treating a chromated or phosphated surface comprising:

exposing at least a portion of the surface to a first medium comprising water, about 1 to about 15 wt % of at least one oligomeric silicate and combinations thereof, wherein said medium has a basic pH and wherein the first medium has a temperature of about 25 to about 95° C.,

drying the substrate, and;

exposing at least a portion of the surface to a second medium comprising colloidal silica.

20. The method of claim 19 wherein the surface comprises a chromated surface.

21. The method of claim 19 wherein the surface comprises a phosphated surface.

22. The method of claim 1 wherein the first medium comprises about 10 wt. % sodium silicate and the temperature of the first medium is about 75° C.

23. The method of claim 19 wherein said exposing to the first medium comprising an electrolytic process.

24. The method of claim 19 wherein said exposing to the first medium comprises an electroless process.

25. The method of claim 19 wherein prior to the first exposing step the surface is cleaned.

26. The method of claim 19 wherein subsequent to second exposing step the surface is treated with an acidic medium.

27. The method of claim 19 wherein zinc or zinc alloys underlie the chromated or phosphated surface.

28. A method for treating an electrically conductive surface comprising:

contacting at least a portion of the surface with a first medium having a basic pH and substantially free of chromates and comprising sodium silicate comprising at least about 13 w/w % Na2O wherein the first medium has a temperature of about 25 to 95° C. and the first medium comprises an electrolytic environment wherein the surface comprises the cathode, and;

contacting at least a portion of the surface with a second medium comprising at least one siliceous material.

29. A method for treating an electrically conductive surface comprising:

contacting at least a portion of the surface with a first medium having a basic pH and substantially free of chromates and comprising sodium silicate comprising at least about 13 w/w % Na2O wherein the first medium has a temperature of about 25 to 95° C.,

rinsing with a solution comprising water and at least one dopant, and;

contacting at least a portion of the surface with a second medium comprising at least one siliceous material.

30. The method of claim 28 further comprising applying at least one coating upon the treated surface.

31. The method of claim 29 further comprising applying at least one coating upon the treated surface.

Assignments (9)
RELEASE OF U.S. SECURITY INTEREST IN PATENTS Recorded Mar 10, 2025
From: BANK OF AMERICA, N.A.
To: ACCURIDE CORPORATION; KIC LLC; GUNITE CORPORATION; ACCURIDE EMI, LLC
Reel/Frame 070454/0744 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2025
From: ALTER DOMUS (US) LLC, AS PREPETITION AGENT
To: GUNITE CORPORATION; KIC LLC; ACCURIDE CORPORATION
Reel/Frame 070464/0012 →
ASSIGNMENT TO SECURITY INTEREST IN PATENTS AT REEL 040680/FRAME 0557 TO SUCCESSOR COLLATERAL AGENT BY RESIGNING COLLATERAL AGENT Recorded Aug 12, 2024
From: ROYAL BANK OF CANADA, AS RESIGNING COLLATERAL AGENT
To: ALTER DOMUS (US) LLC, AS SUCCESSOR COLLATERAL AGENT
Reel/Frame 068549/0776 →
PATENT SECURITY INTEREST ASSIGNMENT AGREEMENT Recorded Oct 22, 2018
From: ROYAL BANK OF CANADA
To: BANK OF AMERICA, N.A., AS SUCCESSOR AGENT
Reel/Frame 047287/0054 →
RELEASE OF SECURITY INTEREST Recorded Nov 23, 2016
From: WELLS FARGO BANK, NATIONAL ASSOCIATION
To: ACCURIDE CORPORATION; ACCURIDE EMI, LLC; GUNITE CORPORATION
Reel/Frame 040680/0480 →
ABL CREDIT AGREEMENT Recorded Nov 23, 2016
From: ACCURIDE CORPORATION; GUNITE CORPORATION; ACCURIDE EMI, LLC
To: ROYAL BANK OF CANADA
Reel/Frame 040680/0557 →
SECURITY INTEREST Recorded Nov 23, 2016
From: ACCURIDE CORPORATION; GUNITE CORPORATION; ACCURIDE EMI
To: ROYAL BANK OF CANADA
Reel/Frame 040800/0267 →
SECURITY INTEREST Recorded Sep 12, 2014
From: ACCURIDE CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 033729/0097 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2014
From: ELISHA HOLDING LLC
To: ACCURIDE CORPORATION
Reel/Frame 032645/0001 →