Gas barrier film
View Patent ↗The invention provides a gas barrier film having a support including a hydrophilic surface or a non-ionic hydrophobic surface on which a graft polymer chain having a polar group is present, and an inorganic thin film formed on the surface.
1. A method of producing a gas barrier film comprising the steps of: preparing a substrate made of polyester; allowing the substrate to react with a hydrophilic polymer selected from the group consisting of polyacrylic acid, polymethacrylic acid, polystyrene sulfonic acid, poly-2-acrylamide-2-methylpropane sulfonic acid and salts thereof, polyacrylamide, and polyvinyl acetamide, the hydrophilic polymer having at a terminal end or in a side chain thereof a functional group that is capable of reacting with the substrate to form a hydrophilic graft polymer layer; and forming an inorganic thin film on the formed hydrophilic graft polymer layer by a gas phase method using an inorganic compound or by an inorganic fine particle adsorption method,
wherein the functional group is selected from the group consisting of a silane coupling group, an isocyanate group, an amino group, a hydroxyl group, a carboxyl group, a sulfonic acid group, a phosphoric acid group, and an epoxy group.
2. A method of producing a gas barrier film according to claim 1 , wherein the gas phase method is selected from the group consisting of chemical vapor deposition, vacuum deposition and sputtering.
3. A method of producing a gas barrier film according to claim 1 , wherein an inorganic material of the inorganic thin film is selected from the group consisting of aluminum (Al), zinc (Zn), magnesium (Mg), nickel (Ni), chromium (Cr), zinc oxide (ZnO), titanium oxide (TiO 2 ), aluminum oxide (Al 2 O 3 ), magnesium oxide (MgO), tin oxide (SnO 2 ), indium oxide (In 2 O 3 ), indium tin oxide (ITO), silicon (Si), silicon monoxide (SiO) and silicon dioxide (SiO 2 ).
4. A method of producing a gas barrier film according to claim 1 , wherein the inorganic thin film has a thickness of 10 to 1,000 nm.
5. A method of producing a gas barrier film comprising the steps of:
preparing a substrate made of polyester;
applying energy to the surface of the substrate by plasma irradiation, light irradiation or heating to provide active species on the surface of the substrate;
allowing the substrate having the active species on the surface thereof to react with a compound having a hydrophilic functional group and a double bond in a molecule, to polymerize the compound from a starting point on the substrate to thereby form a hydrophilic graft polymer layer; and
forming an inorganic thin film on the formed hydrophilic graft polymer layer by a gas phase method using an inorganic compound or by an inorganic fine particle adsorption method,
wherein the hydrophilic functional group is selected from the group consisting of an ammonium group, a phosphonium group, a sulfonic acid group, a carboxyl group, a phosphoric acid group and a phosphonic acid group.
6. A method of producing a gas barrier film according to claim 5 , wherein the gas phase method is selected from the group consisting of chemical vapor deposition, vacuum deposition and sputtering.
7. A method of producing a gas barrier film according to claim 5 , wherein an inorganic material of the inorganic thin film is selected from the group consisting of aluminum (Al), zinc (Zn), magnesium (Mg), nickel (Ni), chromium (Cr), zinc oxide (ZnO), titanium oxide (TiO 2 ), aluminum oxide (Al 2 O 3 ), magnesium oxide (MgO), tin oxide (SnO 2 ), indium oxide (In 2 O 3 ), indium tin oxide (ITO), silicon (Si), silicon monoxide (SiO) and silicon dioxide (SiO 2 ).
8. A method of producing a gas barrier film according to claim 5 , wherein the inorganic thin film has a thickness of 10 to 1,000 nm.