Semiconductor device including multiple field effect transistors, with first FETs having oxide spacers and the second FETs having oxide nitride oxidation protection
View Patent ↗A semiconductor device and a manufacturing method thereof permitting the quality of gate insulating films to be prevented from deteriorating and thereby permitting electrical characteristics of the device to be prevented from deteriorating are provided. In a semiconductor device including a plurality of field effect transistors, an oxidation protection film 21 is formed on a side of one gate electrode 19.
1. A semiconductor device including a plurality of field effect transistors including a first field effort transistor and a second field effect transistor,
said first field effect transistor including,
a pair of first source/drain regions formed on a main surface of a semiconductor substrate, spaced apart from each other and having a channel region therebetween,
a first gate insulating film of a first thickness formed on said first channel region and including an oxide nitride film, and
a first gate electrode, having side surfaces with oxide spacers thereon, formed on said first gate insulating film,
said second field effect transistor including,
a pair of second source/drain regions formed on the main surface of said semiconductor substrate, spaced apart from each other and having a second channel region therebetween,
a second gate insulating film formed on said second channel region and having a second thickness larger than said first thickness,
a second gate electrode, having side surfaces, formed on said second gate insulating film;
an oxide nitride oxidation protection film formed on the side surfaces of the second gate electrode; and
an oxide film spacer formed on the oxide nitride protection film.
2. A The semiconductor device according to claim 1 , wherein the oxide nitride oxidation protection film extends on the second gate insulating film.