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App. No. 10/371,262 · Confirmation No. 9366

Photoresist composition for deep ultraviolet lithography

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2004-11-15 ABN Abandonment 2 View
2004-06-11 CTNF Non-Final Rejection 6 View
2004-06-11 892 List of references cited by examiner 1 View
2004-06-11 SRFW Search information including classification, databases and other search related notes 1 View
2004-06-03 SRNT Examiner's search strategy and results 1 View
2003-05-05 IDS Information Disclosure Statement (IDS) Form (SB08) 6 View
2003-02-21 TRNA Transmittal of New Application 9 View
2003-02-21 SPEC Specification 33 View
2003-02-21 CLM Claims 6 View
2003-02-21 ABST Abstract 1 View
2003-02-21 OATH Oath or Declaration filed 4 View
2003-02-21 WFEE Fee Worksheet (SB06) 1 View
2003-02-21 WFEE Fee Worksheet (SB06) 1 View
2003-02-21 FOR Foreign Reference 54 View
2003-02-21 FOR Foreign Reference 27 View
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Quick Facts
App. No.
10/371,262
Filed
2003-02-21
Pub. No.
US20040166434A1
Art Unit
1752