IP Library Granted Patent US 7,108,952
Granted Patent B2
US 7,108,952 · App. 10/376,257 · Granted Sep 19, 2006

Photopolymerizable composition

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Quick Facts
Patent No.
US 7,108,952
App. No.
10/376,257
Granted
Sep 19, 2006
Kind
B2
Abstract

A photopolymerizable composition comprising a polymer having a radical polymerizable group and a unit represented by the following formula (I): wherein Q 1 represents a cyano group or COX 2 ; X 1 and X 2 each independently represent —R— or a halogen atom, R represents a hetero atom; R a and R b each independently represent a hydrogen atom, a halogen atom, a cyano group or an organic residual group; X 1 and X 2 may be taken together to form a cyclic structure; R a and R b may be taken together to form a cyclic structure; and X 1 and R a or R b may be taken together to form a cyclic structure.

Claims (16)

1. A photopolymerizable composition comprising a polymer having a radical polymerizable group in a side chain and a unit represented by the following formula (I):

wherein Q 1 represents a cyano group or COX 2 ; X 1 represents a halogen atom or a linking group to which another substituent is bonded to form a hydroxyl group, a substituted oxy group, a mercapto group, a substituted thio group, an amino group, a substituted amino group, a sulfo group, a sulfonate group, a substituted sulfinyl group, a substituted sulfonyl group, a phosphono group, a substituted phosphono group, a phosphonate group, a substituted phosphonate group, a nitro group or a heterocyclic group bonded at the hetero atom thereof; X 2 represents a halogen atom or a linking group to which another substituent is bonded to form a hydroxyl group, a substituted oxy group, a mercapto group, a substituted thio group, an amino group, a substituted amino group or a heterocyclic group bonded at the hetero atom thereof; R a and R b each independently represent a hydrogen atom; X 1 and X 2 may be taken together to form a cyclic structure.

2. The photopolymerizable composition according to claim 1 , which comprises a radical polymerizable group introduced into X 1 .

3. The photopolymerizable composition according to claim 1 , which comprises a radical polymerizable group introduced into Q 1 .

4. The photopolymerizable composition according to claim 1 , which comprises a radical polymerizable group introduced into a comonomer unit other than the unit represented by the formula (I).

5. The photopolymerizable composition according to claim 1 , wherein the polymer comprises a comonomer unit having an alkali-soluble group.

6. The photopolymerizable composition according to claim 5 , wherein the alkali-soluble group is a carboxyl group, a phenoxy group, or a sulfamoyl group.

7. The photopolymerizable composition according to claim 4 , wherein the unit represented by the formula (I) comprises a cyclic structure.

8. The photopolymerizable composition according to claim 1 , further comprising an infrared absorber having an absorption wavelengths of 700 to 1200 nm.

9. The photopolymerizable composition according to claim 1 , further comprising an aromatic onium compound as a photopolymerization initiator.

10. The photopolymerizable composition according to claim 1 , further comprising at least one of an aromatic sulfonium salt, an aromatic diazonium salt and an aromatic iodonium salt as a photopolymerization initiator.

11. The photopolymerizable composition according to claim 1 , further comprising a metallocene compound as a photopolymerization initiator.

12. The photopolymerizable composition according to claim 1 , further comprising a titanocene compound as a photopolymerization initiator.

13. The photopolymerizable composition according to claim 1 , further comprising a visible light absorber having an absorption wavelengths of 350 to 700 nm.

14. An image forming method comprising image-wise exposing the photopolymerizable composition according to claim 1 using a semiconductor laser having a wavelength of 400 to 700 nm.

15. An image forming method comprising image-wise exposing the photopolymerizable composition according to claim 1 using a semiconductor laser having a wavelength of 800 to 850 nm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 3, 2003
From: SUGASAKI, ATSUSHI; KUNITA, KAZUTO
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 013837/0123 →