Method for surface treating a die by electron beam irradiation and a die treated thereby
View Patent ↗Method for surface treating a die made of metal in which a low energy, pulsed electron beam, which does not scatter, performs a treatment over a wide area due to presence of anode plasma in a chamber in which the electron beam is formed to smooth and gloss a surface of the die and increase a surface hardness and corrosion resistance of the die. The irradiation may be performed with an energy density not less than 1 J/cm 2 per pulse, at least 5 pulse irradiations and a pulse duration of at least 1 μs. A die subjected to the surface treatment method exhibits improved surface smoothness and glossiness, as well as high corrosion resistance.
1. A method for surface treating a die, comprising the steps of:
generating anode plasma in a chamber; then
forming a low energy, pulsed electron beam in the chamber, the electron beam being directed over a wide area out of a generating region of the anode plasma in view of the presence of the anode plasma; and
placing the die in the path of the electron beam out of a generating region of the anode plasma such that the electron beam smooths and glosses a surface of the die material and increases surface hardness of the die.
2. The method of claim 1 , wherein the electron beam is formed to avoid electron beam scattering.
3. The method of claim 1 , wherein the step of forming the electron beam comprises the steps of using an energy density of about 2 J/cm 2 , a pulse duration of at least 1 μs and at least 5 pulsed irradiations.
4. The method of claim 1 , wherein the step of forming the electron beam comprises the steps of using an energy density of about 7.3 J/cm 2 , a pulse duration of at least 1 μs and at least 5 pulsed irradiations.
5. The method of claim 1 , wherein the step of forming the electron beam comprises the steps of using an energy density of from about 6 J/cm 2 to about 7 J/cm 2 .
6. The method of claim 1 , wherein the step of forming the electron beam comprises the steps of using an energy density of about 4.2 J/cm 2 and at least 5 pulsed irradiations.
7. The method of claim 1 , wherein the step of forming the electron beam comprises the steps of using an energy density of about 7.3 J/cm 2 and at least 5 pulsed irradiations.
8. The method of claim 1 , further comprising the step of reducing the pressure in the chamber to a pressure less than or equal to 3*10 −2 Pa.
9. The method of claim 1 , further comprising the step of introducing an inert gas into the chamber.
10. A method for surface treating a die made of metal, comprising the steps of:
providing a chamber;
disposing said die in said chamber;
disposing an anode and a cathode in said chamber, said anode and said cathode disposed above said metal and said cathode disposed above said anode;
disposing a solenoid exterior to said chamber and adjacent to said anode;
controlling said anode, said solenoid and said cathode for generating anode plasma and generating and directing a low energy, pulsed electron beam over a wide area in the presence of the anode plasma; and
said die being disposed in the path of the electron beam such that the electron beam smooths and glosses a surface of the die material and increases surface hardness of the die.