Wafer-scale manufacturing method

1. A wafer-scale assembly method, comprising:

providing first elements arrayed on a wafer, adjacent ones of the first elements being separated by a predetermined spacing;

providing second elements;

providing a spacing-defining jig including recesses corresponding in size to the second elements, adjacent ones of the recesses being separated by spacing equal to the predetermined spacing;

inserting the second elements into the recesses of the spacing-defining jig; and

affixing the second elements to the wafer with the second elements in alignment with corresponding ones of the first elements.

2. The method of claim 1 , in which:

providing the second elements comprises providing the second elements in a compliantly-interconnected array, adjacent ones of the second elements being separated by spacing that approximates the predetermined spacing; and

the inserting comprises inserting the second elements in the compliantly-interconnected array into the recesses of the space-defining jig.

3. The method of claim 1 , in which the inserting comprises:

providing a pick-and-place apparatus; and

inserting the second elements into the recesses of the spacing-defining jig using the pick-and-place apparatus.

4. The method of claim 1 , in which the inserting comprises:

providing a shake table; and

causing the second elements to insert themselves into the corresponding ones of the recesses of the spacing-defining jig using the shake table.

5. The method of claim 1 , in which:

providing the second elements comprises providing a transfer tray comprising an array of recesses, adjacent ones of the recesses being separated by spacing that approximates the predetermined spacing, each of the recesses being shaped to contain one of the second elements; and

the inserting comprises transferring the second elements from the recesses of the transfer tray to corresponding ones of the recesses of the space-defining jig.

6. The method of claim 5 , in which the transferring comprises applying a pressure differential between the space-defining jig and the transfer tray.

7. The method of claim 1 , in which:

providing the second elements comprises providing a transfer tray comprising a plane, tacky surface on which the second elements are arranged in an array, adjacent ones of the second elements being separated by spacing that approximates the predetermined spacing; and

the inserting comprises transferring the second elements from the transfer tray to the recesses of the space-defining jig.

8. The method of claim 7 , in which the transferring comprises applying a pressure differential between the space-defining jig and the transfer tray.

9. The method of claim 1 , in which:

providing the second elements includes providing the second elements each one having a separation-determining property, the separation-determining property determining a separation of the one of the second elements from the wafer in a z-direction, orthogonal to a major surface of the wafer; and

the method additionally comprises:

measuring the separation-determining property of at least representative ones of the second elements to provide separation-determining property data, and

prior to the affixing and in response to the separation-determining property data, imposing on the second elements selective separations from the wafer in the z-direction.

10. The method of claim 9 , in which:

measuring the separation-determining property includes measuring the separation-determining property for each of the second elements to provide respective separation-determining property data; and

imposing on the second elements selective separations from the wafer in the z-direction includes individually imposing the selective separations on the second elements in response to the respective separation-determining property data.

11. The method of claim 9 , in which:

in providing a spacing-defining jig, the recesses are controllably movable in a direction orthogonal to the array; and

individually imposing the selective separations on the second elements includes moving each of the recesses in the orthogonal direction in response to the separation-determining property data of the one of second elements respectively inserted therein.

12. The method of claim 9 , in which:

providing the second elements comprises providing the second elements in a compliantly-interconnected array, adjacent ones of the second elements being spaced by spacing that approximates the predetermined spacing;

the separation-determining property of each one of the second elements correlates with position of the one of the second elements in the array of second elements; and

imposing on the second elements selective separations from the wafer in the z-direction includes selectively warping the array of second elements in the z-direction in response to the separation-determining property data.

13. The method of claim 12 , in which:

providing the second elements comprises providing the second elements in a compliantly-interconnected array, adjacent ones of the second elements being separated by spacing that approximates the predetermined spacing;

the inserting comprises inserting the second elements in the compliantly-interconnected array into the recesses of the space-defining jig; and

selectively warping the array comprises selectively warping the spacing-defining jig in the z-direction in response to the separation-determining property data.

14. The method of claim 1 , in which:

in providing the second elements, each one of the second elements has a respective separation-dependent property dependent on separation of the one of the second elements from the wafer in a z-direction, orthogonal to a major surface of the wafer; and

the method additionally comprises:

measuring the separation-dependent property of at least representative ones of the second elements, and

prior to the affixing, imposing on the second elements selective separations from the wafer in the z-direction in response to the measured separation-dependent property of at least the representative ones of the second elements.

15. The method of claim 14 , in which:

measuring the separation-dependent property includes measuring the separation-dependent property of each of the second elements; and

imposing on the second elements selective separations from the wafer in the z-direction includes individually imposing the selective separations on the second elements in response to the respective measured separation-dependent property.

16. The method of claim 14 , in which:

providing the second elements comprises providing the second elements in a compliantly-interconnected array in which the separation-dependent property of each one of the second elements correlates with position of the one of the second elements in the array;

in measuring the separation-dependent property of at least representative ones of the second elements, the separation-dependent property of representative ones of the second elements is measured; and

imposing on the second elements selective separations from the wafer in the z-direction includes selectively warping the array of second elements in the z-direction in response to the measured separation-dependent property of the representative ones of the second elements.

17. The method of claim 16 , in which:

providing the second elements comprises providing the second elements in a compliantly-interconnected array; and

selectively warping the array comprises selectively warping the spacing-defining jig in the z-direction in response to the separation-dependent property of the representative ones of the second elements.

18. The method of claim 16 , in which the separation-dependent property is image sharpness.

19. A wafer-scale assembly method, comprising:

providing first elements arrayed on a wafer, adjacent ones of the first elements being separated by a predetermined spacing;

providing second elements, each one of the second elements having a separation-determining property, the separation-determining property determining a separation of the one of the second elements from the wafer in a z-direction, orthogonal to a major surface of the wafer;

measuring the separation-determining property of at least representative ones of the second elements to provide separation-determining property data;

in response to the separation-determining property data, imposing on the second elements selective separations from the wafer in the z-direction;

imposing on the second elements spacing between adjacent ones of the second elements equal to the predetermined spacing; and

affixing the second elements to the wafer with the second elements in alignment with corresponding ones of the first elements.

20. A wafer-scale assembly method, comprising:

providing first elements arrayed on a wafer, adjacent ones of the first elements being separated by a predetermined spacing;

providing second elements, each one of the second elements having a respective separation-dependent property dependent on separation of the one of the second elements from the wafer in a z-direction, orthogonal to a major surface of the wafer;

measuring the separation-dependent property of at least representative ones of the second elements;

imposing on the second elements selective separations from the wafer in the z-direction in response to the measured separation-dependent property of at least the representative ones of the second elements;

imposing on the second elements spacing between adjacent ones of the second elements equal to the predetermined spacing; and

affixing the second elements to the wafer with the second elements in alignment with corresponding ones of the first elements.