IP Library Granted Patent US 6,962,823
Granted Patent B2
US 6,962,823 · App. 10/405,992 · Granted Nov 8, 2005

Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices

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Quick Facts
Patent No.
US 6,962,823
App. No.
10/405,992
Granted
Nov 8, 2005
Kind
B2
Abstract

Nanostructure manufacturing methods and methods for assembling nanostructures into functional elements such as junctions, arrays and devices are provided. Systems for practicing the methods are also provided.

Claims (28)

1. A method of forming nanostructures, the method com prising:

patterning a nanostructure catalyst on a substrate in a plurality of non-spherical patterned elements, wherein a plurality of different nanostructure catalysts are patterned into the patterned elements;

heating the catalyst patterned elements to form nanostructure catalyst spheres, wherein thickness and/or lateral dimension of the patterned elements controls the corresponding diameter of the catalyst spheres;

adding nanostructure precursors to the catalyst spheres; and,

forming nanostructures from the catalyst spheres in the presence of the nanostructure precursors.

2. The method of claim 1 , wherein the different nanostructure catalysts comprise a gold catalyst and an iron catalyst.

3. A method of forming nanostructures, the method comprising:

patterning a nanostructure catalyst on a substrate in a plurality of non-spherical patterned elements, wherein the patterned elements differ in size or composition, wherein sets of patterned elements that differ in size or composition are patterned sequentally;

heating the catalyst patterned elements to form nanostructure catalyst spheres, wherein thickness and/or lateral dimension of the patterned elements controls the corresponding diameter of the catalyst spheres;

adding nanostructure precursors to the catalyst spheres; and,

forming nanostructures from the catalyst spheres in the presence of the nanostructure precursors.

4. A method of forming nanostructures, the method comprising:

patterning a nanostructure catalyst on a substrate in a plurality of non-spherical patterned elements;

heating the catalyst patterned elements to form nanostructure catalyst spheres, wherein thickness and/or lateral dimension of the patterned elements controls the corresponding diameter of the catalyst spheres;

adding nanostructure precursors to the catalyst spheres; and,

forming nanostructures from the catalyst spheres in the presence of the nanostructure precursors;

wherein the patterned elements differ in size or composition, wherein sets of patterned elements that differ in size or composition are patterned into a crossing array of components.

5. A method of forming nanostructures, the method comprising:

patterning a first set of nanostructure catalysts on a substrate in a plurality of non-spherical patterned elements;

heating the catalyst patterned elements to form nanostructure catalyst spheres, wherein thickness and/or lateral dimension of the patterned elements controls the corresponding diameter of the catalyst spheres;

adding a first set of nanostructure precursors to the catalyst spheres;

forming nanostructures from the catalyst spheres in the presence of the first set of nanostructure precursors; and

repeating the patterning, heating, adding and forming steps with a second set of nanostructure catalysts and a second set of nanostructure precursors.

6. The method of claim 5 , wherein the first and second sets of nanostructure catalysts and nanostructure precursors are different.

7. The method of claim 6 , wherein any remaining nanostructure catalyst from the first patterning, beating, adding and forming steps is removed prior to the second patterning, heating, adding and forming steps.

8. The method of claim 7 , wherein the remaining nanostructure catalyst is removed by selective etching.

9. The method of claim 8 , wherein the remaining nanostructure catalyst is removed by selectively etching an etchable region of the nanostructure below the nanostructure catalyst.

10. The method of claim 8 , wherein the selective etching is performed with an acidic etchant.

Assignments (7)
PATENT SECURITY AGREEMENT Recorded Jul 26, 2024
From: ONED MATERIAL, INC.
To: VOLTA ENERGY TECHNOLOGIES, LLC, AS COLLATERAL AGENT
Reel/Frame 068174/0120 →
CHANGE OF NAME Recorded Jul 31, 2020
From: ONED MATERIAL LLC
To: ONED MATERIAL, INC.
Reel/Frame 053375/0462 →
RELEASE OF SECURITY INTEREST Recorded Oct 15, 2016
From: MPEG LA, L.L.C
To: ONED MATERIAL LLC
Reel/Frame 040373/0484 →
RELEASE OF SECURITY INTEREST Recorded Oct 15, 2016
From: MPEG LA, L.L.C
To: ONED MATERIAL LLC
Reel/Frame 040373/0380 →
SECURITY INTEREST Recorded Nov 5, 2014
From: ONED MATERIAL LLC
To: MPEG LA, L.L.C.
Reel/Frame 034171/0227 →
SECURITY INTEREST Recorded Mar 14, 2014
From: ONED MATERIAL LLC
To: MPEG LA, L.L.C.
Reel/Frame 032447/0937 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2014
From: NANOSYS, INC.
To: ONED MATERIAL LLC
Reel/Frame 032264/0148 →