Siloxane-modified polyimide resin
View Patent ↗This invention relates to a siloxane-modified polyimide resin which shows excellent adhesiveness and can be bonded by thermocompression at high temperature even after subjection to thermal hysteresis in the manufacturing step for electronic parts. This polyimide resin is obtained from an aromatic tetracarboxylic acid dianhydride (A) and a diamine (B) comprising 30–95 mol % of a bis(4-aminophenoxy)alkane (B1) and 5–70 mol % of a siloxanediamine (B2) as essential components.
1. A polyimide resin which is obtained from an aromatic tetracarboxylic acid dianhydride (A) and a diamine (B) comprising 40–70 mol % of an aromatic diamine having an aliphatic straight chain (B1) represented by the following general formula (1)
(wherein n is 3–10 denoting the average number of repeating units) and 30–60 mol % of a siloxanediamine (B2) represented by the following general formula (2)
(wherein R 1 and R 2 are divalent hydrocarbon radicals, R 3 –R 6 are hydrocarbon radicals containing 1–6 carbon atoms and m is 1–10 denoting the average number of repeating units) as essential components, and
wherein the polyimide resin has a glass transition temperature of 30–200° C.
2. A polyimide resin as described in claim 1 wherein the polyimide resin has the following properties:
(1) The Young's modulus (storage modulus) at 250° C. is 10 6 Pa or more; and
(2) When a film of the polyimide is subjected to thermal hysteresis at 270° C. for 5 minutes and then bonded by thermocompression to the mirror-finished surface of a silicon chip adherend at 320° C. and 2 MPa, the peel strength between the silicon chip adherend and the polyimide film at room temperature is 0.8 kN/m or more.
3. A polyimide resin as described in claim 2 wherein the polyimide resin is used as an adhesive.
4. A polyimide resin composition which comprises 99.5–90% by weight of the polyimide resin described in claim 1 and 0.5–10% by weight of a pigment.