Pattern writing apparatus and pattern writing method
View Patent ↗An image recording apparatus ( 1 ) has a stage unit ( 2 ) for holding a substrate ( 9 ), an irradiation unit ( 4 ) having a plurality of irradiation parts ( 40 ) and a mechanism for relatively moving the stage unit ( 2 ) and the irradiation unit ( 4 ). An irradiation part ( 40 ) is provided with a DMD having a group of micromirrors for modulating a reflected light beam and a micro moving mechanism for moving the DMD relatively to the irradiation unit ( 4 ) in the X direction, thereby microscopically moving an irradiation position of the irradiation part ( 40 ) in the X direction. The irradiation part ( 40 ) is further provided with a zoom lens, thereby magnifying and reducing an image of the DMD on the substrate ( 9 ). By controlling a plurality of irradiation parts ( 40 ) parallelly and independently, the image recording apparatus ( 1 ) can write a fine pattern at high speed.
1. A pattern writing apparatus for writing a pattern by irradiating a photosensitive material with light modulated on the basis of image data, comprising:
an irradiation unit which comprises a plurality of irradiation parts for irradiating a photosensitive material with a plurality of light beams each of which is modulated;
a scanning mechanism for scanning said photosensitive material relatively to said irradiation unit while said photosensitive material is irradiated with said plurality of light beams; and
an irradiation position control mechanism for changing intervals of a plurality of irradiation positions corresponding to said plurality of irradiation parts in a direction almost orthogonal to a scan direction of said photosensitive material.
2. The pattern writing apparatus according to claim 1 , wherein
said irradiation position control mechanism moves said plurality of irradiation positions independently from one another.
3. The pattern writing apparatus according to claim 1 , further comprising
a mechanism for moving said irradiation unit in a direction almost orthogonal to said scan direction of said photosensitive material.
4. The pattern writing apparatus according to claim 1 , wherein
each of said plurality of irradiation parts comprises a zoom lens.
5. The pattern writing apparatus according to claim 4 , wherein
said zoom lens of each of said plurality of irradiation parts is controlled independently from those of other irradiation parts.
6. The pattern writing apparatus according to claim 1 , further comprising
a position sensor for detecting a scanning position of said scanning mechanism,
wherein emission of said plurality of light beams from said plurality of irradiation parts are controlled on the basis of an output of said position sensor.
7. The pattern writing apparatus according to claim 1 , wherein
each of said plurality of irradiation parts comprises:
a light source;
a spatial light modulator for spatially modulating a light from said light source; and
an optical system for guiding a light beam from said spatial light modulator to said photosensitive material.
8. The pattern writing apparatus according to claim 7 , wherein
said irradiation position control mechanism comprises a mechanism for moving at least said spatial light modulator relatively to said irradiation unit.
9. The pattern writing apparatus according to claim 7 , wherein
said spatial light modulator is a digital micromirror device.
10. The pattern writing apparatus according to claim 7 , wherein
said irradiation position control mechanism comprises a mechanism for individually rotating a projected image of said spatial light modulator formed on said photosensitive material with a light beam emitted from each of said plurality of irradiation parts.
11. The pattern writing apparatus according to claim 1 , further comprising
a photoreceptor for receiving a light from at least one of said plurality of irradiation positions.
12. The pattern writing apparatus according to claim 11 , wherein
said photoreceptor receives lights from at least two positions on said photosensitive material irradiated with light beams, and
said irradiation position control mechanism is controlled on the basis of an output of said photoreceptor.
13. The pattern writing apparatus according to claim 11 , wherein
a positional relation between said plurality of irradiation positions and said irradiation unit is checked on the basis of said output of said photoreceptor.
14. A pattern writing method for writing a pattern by irradiating a photosensitive material with light modulated on the basis of image data, comprising the steps of:
changing intervals of a plurality of irradiation positions of a plurality of light beams emitted from a plurality of irradiation parts in a direction almost orthogonal to a scan direction of a photosensitive material, an irradiation unit comprising said plurality of irradiation parts, said plurality of light beams being each modulated; and
scanning said photosensitive material relatively to said plurality of irradiation parts while said photosensitive material is irradiated with said plurality of light beams.
15. The pattern writing method according to claim 14 , wherein
said plurality of irradiation positions are moved independently from one another in said step of changing intervals of said plurality of irradiation positions.
16. The pattern writing method according to claim 14 , further comprising the step of
moving said irradiation unit in a direction almost orthogonal to said scan direction of said photosensitive material.
17. The pattern writing method according to claim 14 , wherein
a size of an irradiation region corresponding to each of said plurality of irradiation parts is changed in said step of scanning said photosensitive material.
18. The pattern writing method according to claim 17 , wherein
a size of an irradiation region corresponding to each of said plurality of irradiation parts is changed independently.
19. The pattern writing method according to claim 14 , further comprising the steps of:
receiving lights from at least two positions on said photosensitive material irradiated with light beams; and
obtaining the amounts of deviation of said plurality of irradiation positions on the basis of a result of receiving lights from said at least two positions.
20. The pattern writing method according to claim 19 , wherein
a positional relation between said plurality of irradiation positions and said irradiation unit on the basis of said result of receiving lights.