Surface acoustic wave device and electronic component comprising it
View Patent ↗In a surface acoustic wave device, a common portion and a strip portion of a reflector electrode are partially cut off to increase a space between the electrodes. The increase of the space between the electrodes reduces the influence of the amount of charges and the influence of an unbalance between the amounts of charges in etching of a metallic film, thereby preventing the electrodes from having a curved shape in section. Consequently, the surface acoustic wave device has a reduced propagation loss.
1. A surface acoustic wave device comprising:
a piezoelectric substrate;
an interdigital electrode provided on said piezoelectric substrate; and
a reflector electrode provided on said piezoelectric substrate, said reflector electrode including a common portion and a strip portion,
wherein said common portion and said strip portion of said reflector electrode have respective cut portions adjacent to said interdigital electrode formed therein.
2. The surface acoustic wave device of claim 1 , wherein said common portion and said strip portion of said reflector electrode having said cut portions have potentials generated therein different from a potential generated in said interdigital electrode adjacent to said common portion and said strip portion.
3. The surface acoustic wave device of claim 1 , wherein said interdigital electrode and said reflector electrode have all corners adjacent to each other cut off.
4. The surface acoustic wave device of claim 1 ,
wherein said piezoelectric substrate is split from a piezoelectric substrate wafer, and
wherein an amount of said cut portion in a central portion of said piezoelectric substrate wafer is smaller than an amount of said cut portion in an outer portion of said wafer.
5. The surface acoustic wave device of claim 1 , wherein said interdigital electrode and said reflector electrode are formed by dry etching.
6. The surface acoustic wave device of claim 1 , wherein said interdigital electrode and said reflector electrode include material less susceptible to etching than Al.
7. The surface acoustic wave device of claim 6 , wherein said material less susceptible to etching than Al has larger mass than Al.
8. The surface acoustic wave device of claim 1 , wherein said interdigital electrode and said reflector electrode have thicknesses of 150 nm or more.
9. The surface acoustic wave device of claim 1 , wherein a ratio (S/L) of a space (S) between said interdigital electrode and said reflector electrodes to a thickness (L) of each of said electrodes is 2.5 or more.
10. The surface acoustic wave device of claim 1 ,
wherein a cut width of said cut portion of said common portion in a longitudinal direction of said strip portion of said reflector electrode is ¼ to 1 times of a width of said common portion of said reflector electrode, and
wherein a cut width in a longitudinal direction of said cut portion of said strip portion is ½ to 6 times of a width of said strip portion.
11. The surface acoustic wave device of claim 1 , wherein said interdigital electrode includes a common portion having a cut portion formed partially therein.
12. The surface acoustic wave device of claim 11 , wherein a cut width of said cut portion of said common portion of said interdigital electrode in one of a width direction and a longitudinal direction of said strip portion is ¼ to 1 times of a width of said common portion of said interdigital electrode.
13. The surface acoustic wave device of claim 1 , wherein a maximum space between said cut portion of said strip portion and said interdigital electrode in a direction of a width of said strip portion is 1.2 or more times of a space between a portion of said strip portion other than said cut portion of said strip portion and said interdigital electrode.
14. The surface acoustic wave device of claim 1 , wherein said cut portion is formed in a step shape.
15. The surface acoustic wave device of claim 1 , wherein said cut portion is cut linearly.
16. The surface acoustic wave device of claim 1 , wherein said cut portion is formed in curve.
17. The surface acoustic wave device of claim 1 , wherein said cut portion is formed stepwise.
18. The surface acoustic wave device of claim 1 , wherein said cut portion is shaped into a combination of at least two of a step, a linear shape, a curved shape and a stepwise shape.
19. A unit comprising:
a base;
a surface acoustic wave device disposed on said base, said surface acoustic wave device including
a piezoelectric substrate,
an interdigital electrode provided on said piezoelectric substrate, and
a reflector electrode provided on said piezoelectric substrate, said reflector electrode including a common portion and a strip portion, said common portion and said strip portion having respective cut portions adjacent to said interdigital electrode;
one of a bump and a wire for electrically coupling said base to said surface acoustic wave device; and
a cover for sealing said surface acoustic wave device.
20. A method of manufacturing a surface acoustic wave device, comprising the steps of:
forming a plurality of interdigital electrodes on a piezoelectric substrate wafer;
forming a plurality of reflector electrodes on the piezoelectric substrate wafer, the plurality of reflector electrodes each including a common portion and a strip portion having respective cut portions formed therein adjacent to the interdigital electrode; and
dividing the piezoelectric substrate wafer to obtain a plurality of surface acoustic wave devices each including at least one of the plurality of interdigital electrodes and at least one of the plurality of reflector electrodes, wherein an amount of the cut portion of a surface acoustic wave device of the plurality of surface acoustic wave devices that is located at a central portion of the piezoelectric substrate wafer is smaller than a surface acoustic wave device of the plurality of surface acoustic wave devices that is located in an outer portion of the wafer.
21. The method of claim 20 ,
wherein said step of forming the plurality of interdigital electrodes includes the sub-step of forming the plurality of interdigital electrodes by dry etching, and
wherein said step of forming the plurality of reflector electrodes includes the sub-step of forming the plurality of reflector electrodes by dry etching.