IP Library Granted Patent US 7,998,329
Granted Patent B2
US 7,998,329 · App. 10/436,479 · Granted Aug 16, 2011

Porous nickel foil for negative electrode of alkaline battery, production method therefor and production device therefor

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Quick Facts
Patent No.
US 7,998,329
App. No.
10/436,479
Granted
Aug 16, 2011
Kind
B2
Abstract

A porous nickel foil for a negative electrode of an alkaline battery formed by an electrolytic deposition method, wherein the porous nickel foil is flexible and has a thickness of 10-35 μm and a Vickers hardness of 70-130. An electrodeposition drum for producing porous metal foil by an electrolytic deposition method including a drum having a surface onto which metal foil is deposited, a plurality of holes formed in the surface and an insulating resin filled in the holes, wherein the ratio of depth L and diameter D (L/D) of the hole is at least 1 and no clearance, into which deposited metal otherwise cuts in a wedge shape, exists at the boundary between the insulating resin filled in the hole and an opening edge of the hole.

Claims (4)

1. A method for producing a porous nickel foil for a negative electrode of an alkaline battery comprising the steps of producing porous nickel foil of 10-35 μm thick by an electrolytic deposition method and softening or annealing the porous nickel foil such that the porous nickel foil has a Vickers hardness of 70-130,

said electrolytic deposition method in said step of producing porous nickel foil includes the step of depositing nickel foil on a surface of an electrodeposition drum having holes filled with insulating resin, wherein the nickel foil includes through-holes formed at positions corresponding to the insulating resin,

wherein the ratio of depth L and diameter D (L/D) of the hole filled with insulating resin is at least 1 and no clearance, into which deposited metal otherwise cuts in a wedge shape, wherein no opening exists at the boundary between the insulating resin filled in the hole and an opening edge of the hole.

2. The method according to claim 1 , wherein the softening or annealing is carried out at a temperature of 450-900° C.

Assignments (2)
CHANGE OF NAME Recorded Nov 19, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021858/0958 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 25, 2003
From: SHIOTA, TOSHIAKI; NOUMI, RYOICHI; FUKUI, KUNIHIRO; KIMOTO, MASANARI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 014431/0750 →