Liquid crystal display device and method of fabricating the same

1. A method of fabricating a liquid crystal display device, comprising:

providing a first substrate;

forming a conductive layer on a rear surface of a second substrate;

forming a black matrix layer and a color filter layer on a front surface of the second substrate;

simultaneously baking at least one of the black matrix layer and the color filter layer and annealing the conductive layer; and

attaching the first and the second substrates.

2. The method according to claim 1 , wherein the conductive layer includes indium tin oxide.

3. The method according to claim 1 , wherein the baking and annealing are performed at a temperature of about 210° to about 230° C.

4. The method according to claim 1 , wherein providing the first substrate comprises:

forming a plurality of data and gate lines defining a plurality of pixel regions on the first substrate;

forming a thin film transistor within the pixel region; and

forming at least one pair of electrodes within the pixel region.

5. A method for fabricating a color filter substrate of a liquid crystal display panel, comprising:

forming a transparent conductive layer on a first surface of a substrate;

conveying the substrate to a color filter system;

forming a black matrix layer and a color filter layer on a second surface of the substrate opposite to the first surface;

simultaneously baking at least one of the black matrix layer and the color filter layer and annealing the transparent conductive layer.

6. The method according to claim 5 , wherein conveying of the substrate is performed at room temperature.

7. A liquid crystal display device fabricated by a method, comprising:

providing a first substrate;

forming a conductive layer on a rear surface of a second substrate;

forming a black matrix layer and a color filter layer on a front surface of the second substrate;

simultaneously baking at least one of the black matrix layer and the color filter layer and annealing the conductive layer; and

attaching the first and the second substrates.

8. The device according to claim 7 , wherein the conductive layer includes indium tin oxide.

9. The device according to claim 7 , wherein the baking and annealing are performed at a temperature of about 210° to about 230° C.

10. The device according to claim 7 , wherein providing the first substrate comprises:

forming a plurality of data and gate lines defining a plurality of pixel regions on the first substrate;

forming a thin film transistor within the pixel region; and

forming at least one pair of electrodes within the pixel region.

11. A color filter substrate of a liquid crystal display panel fabricated by a method, comprising:

forming a transparent conductive layer on a first surface of a substrate;

conveying the substrate to a color filter system;

forming a black matrix layer and a color filter layer on a second surface of the substrate opposite to the first surface;

simultaneously baking at least one of the black matrix layer and the color filter layer and annealing the transparent conductive layer.

12. The color filter substrate according to claim 11 , wherein conveying of the substrate is performed at room temperature.