Reflective liquid crystal display device and fabricating method thereof

1. A liquid crystal display device, comprising:

first and second substrates spaced apart from each other;

a gate line and a data line over an inner surface of the first substrate, the gate line and the data line crossing each other and defining a sub-pixel region;

a thin film transistor connected to the gate line and the data line;

a first passivation layer on the thin film transistor layer, the first passivation layer directly on the thin film transistor, the data line and a channel region of the thin film transistor, the first passivation layer having a plurality of first uneven patterns in the sub-pixel region;

a second passivation layer acting as a light-shielding layer on the first passivation layer, the second passivation layer having a plurality of second uneven patterns on the first uneven patterns; and

a reflective layer on the second passivation layer, the reflective layer having a plurality of third uneven patterns on the second uneven patterns.

2. The device according to claim 1 , further comprising,

a common electrode on an inner surface of the second substrate; and

a liquid crystal layer between the reflective layer and the common electrode.

3. The device according to claim 1 , wherein the second passivation layer has an optical density greater than 3.

4. The device according to claim 1 , wherein the second passivation layer is formed of a black resin.

5. The device according to claim 1 , further comprising a planarization layer on the reflective layer.

6. The device according to claim 2 , further comprising a color filter layer between the second electrode and the common electrode.

7. The device according to claim 1 , wherein the thin film transistor comprises a gate electrode, a semiconductor layer, and source and drain electrodes.

8. The device according to claim 7 , wherein the second passivation layer has a drain contact hole exposing a portion of the drain electrode through the first passivation layer.

9. The device according to claim 7 , wherein the reflective layer is connected to the drain electrode through the drain contact hole.

10. The device according to claim 7 , further comprising an interlayer insulating layer on the reflective layer and a transparent electrode on the interlayer insulating layer, wherein the reflective layer is electrically floated.

11. The device according to claim 10 , wherein the interlayer insulating layer has a drain contact hole exposing a portion of the drain electrode through the first and second passivation layers, and the transparent electrode is connected to the drain electrode through the drain contact hole.

12. A method of fabricating a liquid crystal display device, comprising:

forming a gate line and a data line crossing each other over a first substrate, the gate line and the data line defining a sub-pixel region;

forming a thin film transistor connected to the gate line and the data line;

forming an organic material layer on the thin film transistor layer;

forming a first passivation layer directly on the thin film transistor, the data line and a channel region of the thin film transistor, the first passivation layer having a plurality of first uneven patterns in the sub-pixel region;

forming a second passivation layer acting as a light-shielding layer on the first passivation layer, wherein the second passivation layer has a plurality of second uneven patterns on the first uneven patterns of the first passivation layer;

forming a reflective layer on the second passivation layer, wherein the reflective layer has a plurality of third uneven patterns on the second uneven patterns of the second passivation layer;

forming a common electrode on a second substrate;

attaching the first and second substrates to each other such that the reflective layer faces into the common electrode; and

forming a liquid crystal layer between the reflective layer and the common electrode.

13. The method according to claim 12 , wherein the second passivation layer has an optical density greater than 3.

14. The method according to claim 13 , wherein the second passivatian layer is fanned of a black resin.

15. The device according to claim 5 , wherein the planarization layer includes an alignment layer and a refractive index of the planarization layer is similar to a refractive index of the liquid crystal layer.

16. The device according to claim 5 , wherein a refractive index of the planarization layer is about 1.5.

17. The device according to claim 12 , further comprising forming a planarization layer on the reflective layer.

18. The device according to claim 17 , further including forming an alignment layer on the planarization layer, wherein a refractive index of the planarization layer is similar to a refractive index of the liquid crystal layer.

19. The device according to claim 17 , wherein a refractive index of the planarization layer is about 1.5.

20. A liquid crystal display device, comprising:

first and second substrates spaced apart from each other;

a gate line and a data line over an inner surface of the first substrate, the gate line and the data line crossing each other and defining a sub-pixel region;

a thin film transistor connected to the gate line and the data line;

a first passivation layer on the thin film transistor layer, the first passivation layer having a plurality of first uneven patterns in the sub-pixel region;

a second passivation layer acting as a light-shielding layer on the first passivation layer, the second passivation layer having a plurality of second uneven patterns on the first uneven patterns; and

a reflective layer on the second passivation layer, the reflective layer having a plurality of third uneven patterns on the second uneven patterns and being electrically floated.