IP Library Granted Patent US 7,504,074
Granted Patent B2
US 7,504,074 · App. 10/457,335 · Granted Mar 17, 2009

Chlorine dioxide generation systems

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Quick Facts
Patent No.
US 7,504,074
App. No.
10/457,335
Granted
Mar 17, 2009
Kind
B2
Abstract

A chloride dioxide generation system made efficient by the use of a minimum number of seals and the use of a sophisticated computerized control system with the chlorine dioxide generation system comprising a) multiple PID loop control, b) a touch screen interface (HMI), c) automatic flow control of chemical precursors, d) a process controller, e) a minimum number of seals, f) a seal-less vacuum eductor, g) a unit design of the ejector; seal-less tubing connector and seal-less manual flowmeters, h) a vacuum eductor to be used with gas supply and other chemical feeds, i) a mass dispersion chlorine flowmeter to accurately supply amount of chlorine gas, j) an optical chlorine dioxide analyzer looped to the process controller and k) an automatic efficiency control screen.

Claims (39)

1. A chlorine dioxide generation system, comprising:

a reaction column;

a source of sodium chlorite reactant fluidly connected to the reaction column;

a first sensor configured to detect a flow rate of at least one reactant delivered to the reaction column;

a second sensor configured to detect a chlorine dioxide concentration of a product stream generated by the system;

a controller, in communication with the first and second sensors, configured to:

determine a theoretical chlorine dioxide production rate based on the flow rate of the at least one reactant detected by the first sensor;

determine an actual chlorine dioxide production rate based on the chlorine dioxide concentration detected by the second sensor;

monitor a system efficiency based on the theoretical chlorine dioxide production rate and the actual chlorine dioxide production rate; and

adjust flow of at least one reactant to the reaction column based on the system efficiency.

2. The system of claim 1 , further comprising a source of chlorine reactant fluidly connected to the reaction column.

3. The system of claim 1 , further comprising a source of sodium hypochlorite reactant, and a source of hydrochloric acid reactant fluidly connected to the reaction column.

4. The system of claim 1 , wherein the second sensor comprises an optical chlorine dioxide analyzer.

5. The system of claim 1 , wherein the controller uses a Proportional, Integral and Derivative loop to adjust flow of at least one reactant to the reaction column to produce a desired amount of chlorine dioxide.

6. The system of claim 1 , wherein the first sensor comprises a flow meter configured to provide an output signal to the controller in direct proportion to actual flow of at least one reactant through the flow meter.

7. The system of claim 6 , further comprising a valve in communication with the controller, configured to regulate flow of at least one reactant to the reaction column, wherein the controller provides a control signal to the valve to adjust flow of at least one reactant to the reaction column based on the output signal of the flow meter.

8. The system of claim 7 , wherein the system efficiency is not dependent on linearity of a reactant flow rate with respect to positioning of the valve.

9. The system of claim 1 , wherein a flow of at least one reactant is adjusted in response to the system efficiency being deficient with respect to a predetermined limit.

10. The system of claim 3 , wherein flow of at least one of sodium hypochlorite and hydrochloric acid is adjusted in response to the system efficiency being deficient with respect to a predetermined limit.

11. The system of claim 1 , wherein the controller continuously adjusts a flow rate of at least one reactant to the reaction column.

12. The system of claim 1 , further comprising a vacuum eductor adapted to facilitate delivery of at least one reactant to the reaction chamber.

13. The system of claim 12 , wherein the vacuum eductor comprises a seal-less vacuum eductor.

14. The system of claim 1 , wherein the first sensor comprises an electronic mass dispersion flow meter.

15. The system of claim 1 , further comprising a human machine interface in communication with the controller.

16. The system of claim 15 , wherein the human machine interface comprises a touch screen.

17. The system of claim 1 , wherein the controller is further configured to compare current reactant consumption to historical reactant consumption.

18. The system of claim 1 , further comprising an efficiency control monitor.

19. The system of claim 18 , wherein the efficiency control monitor is provided with an efficiency set point display or a process variable display.

20. The system of claim 1 , wherein the system is substantially free of o-rings.

21. The system of claim 1 , wherein the controller is further configured to monitor a system condition and to provide an alarm if the system condition deviates from an acceptable system condition.

22. The system of claim 2 , wherein flow of at least one of sodium chlorite and chlorine is adjusted in response to the system efficiency being deficient with respect to a predetermined limit.

23. A method of facilitating chlorine dioxide generation, comprising:

providing a controller configured to:

determine a theoretical chlorine dioxide production rate based on a flow rate of sodium chlorite supplied to a reaction column;

determine an actual chlorine dioxide production rate based on a chlorine dioxide concentration detected in a product stream;

monitor a system efficiency based on the theoretical chlorine dioxide production rate and the actual chlorine dioxide production rate; and

adjust a flow rate of at least one reactant to the reaction column based on the system efficiency.

24. The method of claim 23 , further comprising providing a sensor configured to detect the flow rate of sodium chlorite supplied to the reaction column.

25. The method of claim 23 , further comprising providing an optical chlorine dioxide analyzer to detect the chlorine dioxide concentration in the product stream.

Assignments (15)
RELEASE OF SECURITY INTEREST Recorded May 26, 2023
From: JPMORGAN CHASE BANK N.A., AS COLLATERAL AGENT
To: EVOQUA WATER TECHNOLOGIES LLC; NEPTUNE BENSON, INC.
Reel/Frame 063787/0943 →
SECURITY INTEREST Recorded Apr 7, 2021
From: EVOQUA WATER TECHNOLOGIES LLC; NEPTUNE BENSON, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 055848/0689 →
RELEASE OF SECURITY INTEREST (REEL/FRAME 032126/0487) Recorded Apr 6, 2021
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS COLLATERAL AGENT
To: SIEMENS WATER TECHNOLOGIES LLC
Reel/Frame 055845/0245 →
RELEASE OF SECURITY INTEREST (REEL/FRAME 032126/0430) Recorded Apr 6, 2021
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS COLLATERAL AGENT
To: SIEMENS WATER TECHNOLOGIES LLC
Reel/Frame 055845/0311 →
CHANGE OF NAME Recorded Feb 7, 2014
From: SIEMENS WATER TECHNOLOGIES LLC
To: EVOQUA WATER TECHNOLOGIES LLC
Reel/Frame 032174/0282 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT (FIRST LIEN) Recorded Jan 24, 2014
From: WTG HOLDINGS III CORP.; WTG HOLDINGS II CORP.; SIEMENS TREATED WATER OUTSOURCING CORP.; SIEMENS WATER TECHNOLOGIES LLC
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS COLLATERAL AGENT
Reel/Frame 032126/0487 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT (SECOND LIEN) Recorded Jan 24, 2014
From: WTG HOLDINGS III CORP.; WTG HOLDINGS II CORP.; SIEMENS TREATED WATER OUTSOURCING CORP.; SIEMENS WATER TECHNOLOGIES LLC
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH, AS COLLATERAL AGENT
Reel/Frame 032126/0430 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 1, 2014
From: SIEMENS INDUSTRY, INC.
To: SIEMENS WATER TECHNOLOGIES LLC
Reel/Frame 031896/0256 →
MERGER Recorded Apr 15, 2011
From: SIEMENS WATER TECHNOLOGIES HOLDING CORP.
To: SIEMENS INDUSTRY, INC.
Reel/Frame 026138/0593 →
MERGER Recorded Apr 11, 2011
From: SIEMENS WATER TECHNOLOGIES CORP.
To: SIEMENS WATER TECHNOLOGIES HOLDING CORP.
Reel/Frame 026106/0467 →
MERGER Recorded Sep 21, 2007
From: BASIC CHEMICALS COMPANY, LLC
To: OCCIDENTAL CHEMICAL CORPORATION
Reel/Frame 019850/0911 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 19, 2007
From: OCCIDENTAL CHEMICAL CORPORATION
To: SIEMENS WATER TECHNOLOGIES CORP.
Reel/Frame 019848/0570 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2006
From: VULCAN MATERIALS COMPANY; VULCAN CHLORALKALI, LLC
To: BASIC CHEMICALS COMPANY, LLC
Reel/Frame 017730/0078 →
CHANGE OF NAME Recorded Aug 3, 2005
From: VULCAN CHEMICALS; VULCAN CHEMICALS, A DIVISION OF VULCAN MATERIALS COMPANY; VULCAN CHEMICALS, A BUSINESS GROUP OF VULCAN MATERIALS COMPANY
To: VULCAN MATERIALS COMPANY
Reel/Frame 016345/0108 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2003
From: MARTENS, EDWARD M.; SMITH, EARL B.; BECKSTROM, GREGORY J.
To: VULCAN CHEMICALS, A BUSINESS GROUP OF VULCAN MATERIALS COMPANY
Reel/Frame 014160/0589 →